The Short Wavelengths Department is dedicated to the development and precise characterization of laser-based radiation sources as well as the evaluation of optical components in the short-wavelength spectral range. To this end, the department develops and operates specialized analysis systems and methods that systematically determine key quality parameters such as absorption, thermal load capacity, beam stability, damage thresholds, and the long-term behavior of optical materials. In addition, the propagation and coherence properties of laser radiation from the IR to the EUV range are investigated using high-resolution wavefront sensing. A particular focus lies on short-wavelength and deep-UV radiation sources, which are of major importance for semiconductor lithography and other technologically demanding applications.
Another core area is the development of compact laser sources that generate extremely short-wavelength radiation. This specialized light is essential for applications such as chemical analysis, high-precision and time-resolved spectroscopy, or advanced microscopy techniques (e.g., lensless microscopy), and it enables investigations for biomedical applications with spatial resolutions down to the nanometer scale. The department also conducts research on the precise processing of materials using ultrashort laser pulses. By tailoring the laser parameters, microscopic and nanoscopic structures can be created, in some cases with feature sizes of only a few tens of nanometers. Such structures are relevant for a wide range of applications, including security features, functionalized surfaces, and novel optical components. Current research topics also include the fabrication of nanoparticles and the laser-induced modification of thin films or transparent materials.
In addition to these fields, the department increasingly contributes to laser-driven plasma research, particularly in the context of thermal compression and laser-fusion–related studies. Building on high-energy nanosecond pulse systems, the department investigates conditions under which dense plasmas can be generated through controlled thermal compression. These studies include the use of modular high-energy lasers, pulse-shaping strategies to suppress instabilities, and the interaction of tailored laser pulses with low-density foam targets. Such experimental approaches enable laboratory-scale investigations of plasma regimes that are relevant for inertial-fusion research, thereby helping to bridge the gap between table-top systems and large-scale facilities. This emerging research direction strengthens the department’s role in advancing diagnostic techniques, target characterization, and laser–plasma coupling physics.
Overall, through its research and development activities, the department contributes to advancing new technologies in short-wavelength optics, ultrafast laser processing, and laser-driven plasma physics, thereby enhancing the performance and future applicability of optical systems in scientific and industrial fields.
Astigmatic wavefront aberration of a test optic measured at the Free-Electron-Laser FLASH (left) and LiF crystal structured with EUV radiation at 13.5 nm wavelength (right)
Optics characterization
The Short Wavelengths department is concerned with the characterization of laser light sources as well as high quality optics for beam steering and shaping. One focus is put on the deep UV wavelengths (193 nm, 248 nm) relevant for semiconductor microlithography; all other laser relevant wavelengths are also available.
In order to characterize quality and radiation stability of optical components, e.g. absorption, thermal lensing, damage thresholds and long-term degradation we operate several measuring instruments. Furthermore, propagation and coherence properties of laser radiation are measured with high-resolution wavefront sensors.
Moreover, compact laser-driven plasma sources are developed in order to generate extreme ultraviolet (EUV) radiation and soft x-rays being used for several metrological applications such as absorption spectroscopy (NEXFAS), reflectometry and microscopy within the ‘water window’ (λ = 2.2 – 4.4 nm). In addition, stability and damage threshold measurements are conducted for EUV relevant materials and sensors at λ = 13.5 nm using appropriate beam shaping optics.
Damage (left) and wavefront distortion (right) of a Quartz optic due to irradiation with intense UV laser radiation
Stability of (UV-)optics
- Laser-induced damage threshold (LIDT) (´1-on-1´, ´S-on-1´)
- Long-term irradiation
- Degradation tests
Single pulse (‘1-on-1’) and multiple pulse (‘S-on-1’) damage thresholds of coated and uncoated optical elements are measured according to ISO 11254 standard in an automated setup. The on site damage occurrence is detected with online video microscopy and subsequent digital image analysis.
The degradation behavior of optical components is evaluated under long-term irradiation with defined environmental parameters (e.g. inert gas atmosphere or vacuum, controlled temperature). Online monitoring of transmission / reflection allows the optical life time determination of the device.
Available light sources:
- High power excimer laser 351 nm, 248 nm, 193 nm, 157 nm
- Nd:YAG laser 1064 nm, 355 nm, 266 nm
- Pulse repetition rates up to 2 kHz
- Long-term irradiation up to 109 pulses
- flat-top cross-section on target surface
- Test samples: substrates, dielectric layers
Images of macroscopic destruction sites in Quartz after excimer laser or Nd:YAG irradiation respectively
Wavefront deformation / Thermal lenses
Absorption of intense laser radiation causes a thermal load in optical materials leading to local heating of the sample. Subsequentially there are two effects observable:
- Change of local refractive index (dn/dT)
- Surface deformation due to volume exapansion.
Each effect induces a reversible change in the optical properties, i.e. in particular a modification of the transmitted wavefront (“thermal lens”) either enhancing or compensating the overall distortion.
Furthermore, in case of amorphous optical materials (e.g. irradiation of Quartz samples with ArF excimer laser), there are irrversible changes like compaction leading to changes in density and thus in refracative index.
Both thermal lenses and compaction can be detected in real time with the help of a Hartmann-Shack wavefront sensor (cf. page Wavefront Detection). The image below shows a corresponding measurement of a thermal lens within a ArF laser irradiated (193 nm) Quartz plate. Thermal induced deformation of the wavefront develops inside the material within a few seconds. The optical power of the effect (wpv≈2nm) corresponds to a converging lens with a focal length of about 10 km.
Thermal lens induced distorted wavefront within Quartz (phase difference in nm-range)
Absorption / Scattering
According to ISO 11551 absolute absorption of optical components is measured by a high resolution (UV-) laser calorimeter which enables the determination of linear as well as non-linear absorption losses in optical materials. For the used irradiation wavelengths (193 nm, 248 nm, 351 nm) a fast evaluation of the long-term behavior of DUV optics at low energy density is possible.
- Precise measurement of absorption according to ISO 11551 (ppm sensitivity)
- Determination of linear and two-photon absorption coefficients
- Observation of aging and degradation (e.g. color center formation)
- Non-destructive quality control of excimer laser optis
Scattering
Losses in UV-optics due to scattering are evaluated with a special setup consisting of an excimer laser as light source and a coated Ulbricht’s sphere as integrating detector.
- Determination of total scatter (TS) in the UV spectral range
- Sensitivity: <1 ppm at 248 nm, <30 ppm at 193 nm
- 2D mapping of scatter distribution
Left: linear growth in absorption of a Quartz sample at 193 nm due to laser induced color center formation; right: scatter map of super polished CaF2 at 248 nm
Further information
Wavefront deformation / Thermal lenses
M. Stubenvoll et al.:
Measurement and compensation of laser-induced wavefront deformations and focal shifts in near IR optics, Opt. Expr. 22 (21) (2014)
M. Stubenvoll et al: Photothermal method for absorption measurements in anisotropic crystals,
Rev. Sci. Instr. 87 (2016)
Absorption / Scattering
C. Görling et al.:
Comparative studies of absorptance behaviour of alkaline-earth fluorides at 193 nm and 157 nm,
Appl. Phys. B. 74 (3) (2002)
C. Görling et al.:
Surface and bulk absorption in CaF2 at 193 and 157nm, Opt. Comm. 249 (1-3) (2005)
Beam propagation
Modern applications in laser technology demand a comprehensive characterization of the utilized light sources. This makes high precision techniques for determination of the spatial profile as well as standard methods for relevant beam parameters necessary. The Optics / Short Wavelengths department of the Laser-Laboratorium e.V. has been for more than 20 years involved with the comprehensive characterization of laser beam propagation. The applied camera-based detectors are suitable for a broad spectral range (NIR … DUV/EUV).
Beam profile and wavefront of an excimer laser
Beam profiling
Laser applications in industry and science often demand the highest beam stability as well as accurate spatial profile control. Thus, the determination of high resolution intensity distribution and beam parameters is essential. The Optics / Short Wavelengths department offers the comprehensive characterization of laser beams over a broad spectral range. For this task camera-based systems for measurement of near-field and far-field profiles which are sufficient to calculate laser parameters according to ISO-norm (ISO 11146, ISO 13694, ISO 15367). The optimized combination of UV converters with CCD cameras is suitable for important laser wavelengths from NIR (e.g. Nd:YAG) to DUV (ArF excimer laser), EUV (13.5 nm) and soft x-rays (1 – 5 n).
Measured intensity profiles of different lasers
- Beam analysis (NIR, Vis, UV, EUV)
- Beam parameters according to ISO
- Beam propagation / focusability
- Pointing stability
- M2 (setup for caustic measurement)
Wavefront detection
For assessment of the light field’s phase distribution apart from mere beam profiling, camera based wavefront sensors according to the Hartmann-Shack principle are being utilized. The determination of (interpolated) beam profile, wavefront and beam parameters such as diameter, divergence and M² value for coherent radiation enables a complete description of the propagation behavior (cf. Figure 1) via solution of the Fresnel diffraction integral. Thus, the intensity distribution e.g. in far field or at the beam waist may be calculated. The derivation of these values from a single measurement with an accuracy of a few percent makes the device especially suitable for pulsed or strongly fluctuating laser sources.
The wavefront sensor is available as a commercial product, distributed by LOT Quantum Design for the European market (USA: Lightspeed Technologies), that is already applied by several companies and institutes.
Wavefront sensor for the visible light (left) and for EUV and soft x-ray radiation (right)
Coherence analyses / Measurement of 4D coherence function
The high degree of coherence is one of the most important characteristics of laser light which allows for numerous applications. Using Young’s double slit experiment only the basic coherence properties of a beam can be measured as the entire spatial coherence function is four-dimensional.
We pursue the formalism of the Wigner distribution function representing the Fourier transform of the mutual coherence function, which includes all information on the spatial coherence properties of the radiation field. The Wigner distribution function can be accessed experimentally by caustic scans and is reconstructed by an algorithm mapping the measured beam profiles into a four-dimensional phase space. As a result, the global degree of coherence, coherence lengths and beam characteristics such as wavefront, 4D propagation matrix and M² value can be deduced easily.
The method of the Wigner distribution function is suitable for laser beams in a broad spectral range from NIR to EUV and soft x-rays.
Profiles of a caustic scan measured at the free-electron laser FLASH (wavelength 13 nm, top), reconstructed Wigner distribution function as projection (middle) and consequent beam profiles (bottom) matching the measured profiles very well. Here the global degree of coherence is K = 0.02
Further information
Wellenfront-Sensorik
B. Flöter et al.:
EUV Hartmann sensor for wavefront measurements at the Free-electron LASer in Hamburg,
New J. Phys. 12 (2010)
B. Flöter et al.:
Beam parameters of FLASH beamline BL1 from Hartmann wavefront measurements,
Nucl. Instr. Meth. Phys. Res. 635 (2011)
Kohärenz-Analyse / Messung der 4D-Kohärenzfunktion
B. Schäfer, K. Mann:
“Characterization of an ArF excimer laser beam from measurements of the Wigner distribution function”, New J. Phys. 13 (2011)
B. Schäfer et al:
“FEL beam characterization from measurements of the Wigner distribution function”, Nucl. Instr. Meth. Phys. Res. 654 (2011)
T. Mey et al:
“Wigner distribution measurements of the spatial coherence properties of the free electron laser FLASH”, Opt. Expr. 20 (2011)
EUV and soft X-ray radiation
With the help of highly excited laser-induced plasmas as compact light sources, metrology tools for the EUV/XUV spectral range (λ=1…30nm) are being developed within the department. These sources and tools enable laboratory scaled setups e.g. for spectrometry, reflectometry or stability tests independent of synchrotron radiation leading to the capability of in-house EUV/XUV material studies.
Presentation
Some short wavelength research activities of our group are shown in the following presentation being available for free download as pdf-file.
Quell-Vakuumwürfel einer Laborstrahlquelle mit Plasma im Zentrum
Laser-plasma source
By focusing an intense Nd:YAG laser (1064 nm, 700 mJ, 6 ns) into a pulsed gas target (Xenon, Oxygen) an EUV plasma is ignited. The source delivers pulse energies of about 4 mJ at 13.5 nm at repetition rates from 1…10 Hz.
One of the most distinct features is the compact arrangement allowing EUV experiments within laboratory environment. Optimized nozzle geometries lead to conversion efficiencies of up to
0.45 % (cf. also parameters in table 1).
| Wavelength (Xe): | 2-40 nm |
| Plasma diameter: | 300 µm |
| Pulse duration: | 6 ns |
| Repetition rate: | 1…10 Hz |
| Conversion efficiency (Xe): | 0,45 % |
| EUV-Photons/pulse: | 2,4×1014 |
| Pulse energy: | 4,0 mJ(4PI sr, 2 %BW) |
Further Advantages are:
- Flexible choice and continuous supply of target material
- Low amount of dbris
- Low gas consumption
Table-top source (left), pinhole camera image of an EUV plasma (middle) and emission spectra of different target gases (right – top: EUV range, bottom: ‘water-window’)
EUV optics
For the production of high EUV energy densities a modified Schwarzschild objective for 13.5 nm radiation has been developed within the BMBF project KOMPASS (“Kompakte Strahlquelle hoher Brillanz für den weichen Röntgen-Spektralbereich”). It consists of two spherical mirrors (the substrate is ULE glass) which were each given a reflectivity of almost 70% using a Mo/Si multilayer-coating (Fraunhofer IOF). The aperture is 0.44, the magnification is 0.1. The diameter of the resulting EUV focus is < 30 µm at an energy density of about 100 mJ/cm2.
| Magnification (M) | 0.102 |
| Spot size | ~ 30 µm |
| NA | 0.44 |
| Acceptance angle (Ω) | 5.33 msr |
| Substrates | ULE glass |
| Reflectivity of Mo/Si multi-layers (R) | > 65 % (per mirror / IOF) |
Left: Prototype of the compact EUV source with integrated Schwarzschild objectiv (left). By focusing an intense Nd:YAG laser into a pulsed Xe gas target a plasma is ignited emitting radiation at 13.5 nm. Right: The Schwarzschild objective (right) was coated by Fraunhofer IOF in order to achieve a high reflectivity
The Mo/Si multilayer coating allows the Schwarzschild objective to reflect light in a narrow range at 13.5 nm. A broadband beam guidance is possible by means of total reflection at grazing angles. In the scope of the InnoNet project SpeXUV, a Kirkpatrick-Baez configuration was designed (cf. Fig. 2) to be used as a broadband condensator in a spectral photometer in the range 10…20 nm (specifications cf. Table 2).
| Resolution | < 10 µm (1:1-imaging) |
| NA | 0.007 |
| Transmission (twofold reflection) | > 65 % (> 81 % per mirror) |
Schematic illustration of the Kirkpatrick-Baez assembly (left) and photograph of the built condenser (right)
Nanostructuring with EUV radiation
An EUV beam focussing system as presented in the EUV-Optics section was used to investigate the interaction of pulsed soft X-ray radiation with matter for high resolution and direct structuring. This included the generation of color centers in LiF, direct photo-etching of polymers (e.g. PMMA) as well as the determination of the sensitivity of photoresists in the EUV range.
EUV direct structuring by means of generation of color centers in a LiF crystal (left) and photo-etching of a PMMA surface with EUV radiation (right). The diameter of the working spots was 5 µm and 1 µm respectively.
Diffraction of an EUV radiation: The diffractive element consisted of an etched stainless steel grid placed in front of the Schwarzschild objective. The imaging of a pinhole leads to a diffraction pattern on the PMMA probe. Left: AFM imagings of the ablation profile. Right: Comparison with a simulation
X-ray absorption spectroscopy (NEXAFS)
A table-top plasma source combined with a soft x-ray spectrometer is being used for analysis of the near-edge x-ray absorption fine structure (NEXAFS) of thin samples within the “water window”, ranging from λ = 2.2 nm … 4.4 nm. The fine structure of the absorption edges yields information on molecular orbitals, oxidation states and the coordination of an absorbing element, and can therefore be applied for chemical analysis. Due to the high absorption coefficient of the radiation the technique is extremely surface-sensitive. Single-pulse NEXAFS spectra are obtained from a broad-band Krypton plasma, transmitted through a sample and divided by a reference spectrum without the sample.
Data acquired for various organic (polymers, lipids, humic acids, etc.) and inorganic (e.g. iron minerals) samples indicate excellent agreement with synchrotron measurements (Cooperations with G. A. Univ. Göttingen, MPI f. biophys. Chemie, within the SFB 755).
Schematics and photo of NEXAFS spectrometer based on table-top soft x-ray source
NEXAFS spectrum of PCMO acquired with table-top soft x-ray source. The single peaks correspond to electronic transitions in unoccupied molecular orbitals and represent chemical structure and bonds of the sample
Soft x-ray microscopy
Pulsed x-rays are employed for many innovative applications ranging from structural analysis in biology and life sciences to the investigation of fundamental mechanisms of interaction with matter. Intense x-ray pulses allow, for example, tomographic images of the inside of cells or the structure determination of macromolecules with a spatial resolution on the nanometer scale. However, due to the lack of appropriate lab-scale radiation sources such studies are currently conducted at synchrotron or free-electron lasers exclusively.
Within the framework of the SFB 755 “Nanoscale Photonic Imaging” a compact laboratory x-ray microscope is developed for the “water window” spectral range (λ = 2.2 nm … 4.4 nm). A laser plasma generated in a short-pulsed gas jet is focused by a condenser mirror onto a sample, which is then imaged by a Fresnel zone plate onto a camera at high magnification. Using nitrogen as target gas (emission wavelength 2.88 nm), we have demonstrated a spatial resolution of about 50 nm.
Photograph of the table-top soft x-ray microscope, (b) intensity profiles (wavelength 2.88 nm) recorded along the optical axis behind the condenser mirror; the smallest spot size is about 430 µm and (c) Siemens star test pattern imaged with soft x-ray radiation. The inset shows the central part of the Siemens star having a feature size of 50 nm
Further information
Nanostructuring with EUV radiation
F. Barkusky, C. Peth, K. Mann, T. Feigl, N. Kaiser:
“Formation and Direct Writing of Color Centers in LiF using a Laser-Induced Extreme Ultraviolet Plasma in Combination With a Schwarzschild Objective”, Rev. Sci. Instr., 76, 105102, 2005
F. Barkusky, C. Peth, A. Bayer, K. Mann:
“Direct Photo-Etching of PMMA Using Focused Extreme Ultraviolet Radiation From a Table-top Laser-Induced Plasma Source”, J. Appl. Phys., 101, 124908, 2007
X-ray absorption spectroscopy (NEXAFS)
C. Peth et al:
“Near-edge x-ray absorption fine structure measurements using a laboratory-scale XUV source,“J. Phys. D: Appl. Phys. 41 (2008)
F.-C. Kühl et al:
“Near-edge x-ray absorption fine structure spectroscopy at atmospheric pressure with a table-top laser-induced soft x-ray source,” J. Vac. Sci. Technol. A 34 (2016)
Soft x-ray microscopy
M. Müller et al:
“Table-to Soft X-ray Microscopy with a Laser-induced Plasma Source Based on a Pulsed Gas-jet“, AIP Conf. Proc. 1764 (2016)
Products and services
The department Short Wavelengths offers among others comprehensive measurement methods in order to characterize lasers and optics in the spectral range from the near IR down to soft x-ray radiation and the development of customized prototypes.
The physicist, chemists and engineers in our team hold extensive knowledge, competence and technical abilities and place it at your disposal.
Please contact us!
We are looking forward to developing tailored solutions for your problems.
Contact person:
Head of department
Dr. Dong Du Mai
“Short Wavelengths”
Tel.: +49(0)551/5035-43
Fax: +49(0)551/5035-99
dong-du.mai@ifnano.de
Contact person for Short Pulses / Nanostructures
Dr. Peter Simon
“Short Pulses / Nanostructures”
Tel.: +49(0)551/5035-21
FAX: +49(0)551/5035-99
peter.simon@ifnano.de
Beam profiler / caustic scan measurements
Modern applications in laser technology demand a comprehensive characterization of the utilized light sources. Thus, the department of Optics / Short Wavelengths offers high precision techniques for determination of the spatial profile as well as standard methods for relevant beam parameters for more than 20 years. For this purpose camera-based systems have been developed in order to measure the near-filed and far-field intensity profiles allowing to determine the beam parameters according to latest ISO standards (ISO 11146, ISO 13694, and ISO 15367).
• Beam analysis (NIR, Vis, UV, EUV, soft x-rays)
• Beam parameters according to ISO standards
• Beam propagation
• Pointing stability
• M2 (setup for caustic measurement)
Hartmann-Shack wavefront sensor (visible & IR spectral range)
Beam profiling with camera-based Hartmann-Shack wavefront sensors allows a comprehensive determination of relevant beam parameters (profile, wavefront, phase distribution, …) within one measurement making the wavefront sensor especially suitable for pulsed or fluctuating laser sources. Beam diameter, divergence and M2 are derived from the wavefront and the near-field pattern with very high accuracy from a single measurement in real time. Moreover, it enables a complete description of the propagation behavior and thus, the intensity distribution e.g. in far field or at the beam waist may be calculated.
The wavefront sensor is available as a commercial product, distributed by LOT Quantum Design for the European market (USA: Lightspeed Technologies), that is already applied by several companies and institutes.
Hartmann Shack wavefront sensor for the visible spectral range
You can download a free demo version of the “MrBeam”-Software developed in our department to aquire, analyse and manipulate images here:
Wavefront curvature sensor
The department Optics and Short Wavelengths started the ZIM project WKALAS (retention period 2012-2014) in order develop an innovative sensor concept for comprehensive laser beam characterization. By recording two beam profiles at neighbouring z-positions successively, it is possible to reconstruct the wavefront with high spatial resolution from the solution of the transport of intensity equation without the requirement of any external reference. The principle is applicable to a broad spectral range and for the visible and the near infrared, a very compact sensor has been realized. Beyond, in cooperation with DESY, the method has also been applied to the extreme UV at the free-electron laser FLASH in 2015. For the first time, it became possible to characterize the wavefront of the focused FEL beam at its waist position reaching a spatial resolution of below 1 µm.
Wave fronts recorded with Curvature sensor
Photothermal setup
Absorption within the bulk and on the surfaces or dielectric coatings of an optical element under irradiation with a high power or sufficiently tightly focused laser beam causes a spatially and temporally varying temperature distribution in the sample. Using a well-proven photo-thermal setup based upon a highly sensitive Hartmann-Shack wavefront sensor bulk and surface absorption losses can be measured quantitatively.
Laser Beam Stabilization System
The limited pointing stability of high power laser systems is a question of major concern, since fluctuations of the lateral or angular beam position can cause tremendous problems especially in industrial applications. For compensation of drift effects a Laser Beam Stabilization System was developed, which may be utilized for stabilization and realignment of practically all lasers operating in the UV-VIS-NIR spectral range.
Photograph of the Laser Beam Stabilization System
Absorption, scattering & damage threshold measurements
In our department various setups for quantitative evaluation of losses and stability in laser optical components are operated, such as calorimeters, photothermal measuring stations, integral light scattering setups, and ratiometric transmission / reflectivity measurement systems. Both the total losses during (long-term) irradiation of a component as well as their individual contributions (surface, coating, bulk) are determined in order to gain insight into the causes of radiation-induced aging of UV optics.
Measurement setup to determine laser-induced damage thresholds (LIDT) and for long-term irradiation experiments
Laboratory-scale plasma source for EUV and soft x-ray radiation
Laboratory-scale plasma source (left), pinhole camera image of an EUV plasma (middle) and emission spectra of different target gases (right – top: EUV spectral range, bottom: ‘water window’
Laboratory-scale plasma source (left), pinhole camera image of an EUV plasma (middle) and emission spectra of different target gases (right – top: EUV spectral range, bottom: ‘water window’)
Hartmann wavefront sensor
In our group we developed a Hartmann wavefront sensor covering the spectral range between 1 and 60 nm. The sensor is applied by several institutes for example at laser-induced plasma sources, HHG sources, synchrotrons (Triest, Grenoble) and free electron lasers (Hamburg).
Photograph of the wavefront sensor for EUV and soft x-ray radiation (left) and measured wavefront at FLASH (DESY/Hamburg, wavelength 13.5 nm)
Soft X-ray absorption spectroscopy and microscopy
A table-top plasma source combined with a soft x-ray spectrometer is being used for analysis of the near-edge x-ray absorption fine structure (NEXAFS) of thin samples (e.g. C, N, O, Ca, K, Ti, Mn, Fe) within the “water window”, ranging from λ = 2.2 nm … 4.4 nm. The fine structure of the absorption edges yields information on molecular orbitals, oxidation states and the coordination of an absorbing element, and can therefore be applied for chemical analysis.
Additionally, in the department Optics / Short Wavelengths a compact laboratory x-ray microscope is developed for the “water window” spectral range (λ = 2.2 nm … 4.4 nm) achieving a spatial resolution of about 50 nm. Applications range from structural analysis in biology and life sciences.
Table-top NEXAFS-Spektrometer
Siemens star imaged with soft x-ray radiation at wavelength 2.88 nm
Staff members
Dr. Peter Simon
Contact person: Short Pulses / Nanostructures
E-Mail: peter.simon@ifnano.de
Tel.: +49 551 5035-21
Dr. Klaus Mann
Contact Person for photothermal and radiation characterization
E-Mail: klaus.mann@ifnano.de
Tel.: +49 551 5035-51
Dr. Hendrik Wrigge
Staff Member
E-Mail: hendrik.wrigge@ifnano.de
Tel.: +49 551 5035-28
Publications
Publications
- M. Wrigge, T. Held, P. D. Ndione, T. Nagy, B. Rethfeld, P. Simon:
Apparatus for broadband, time-resolved measurements of laser-induced reflectivity transients with sub-10 fs resolution, Optics & Laser Technology (Volume 193, Part B), 114354, https://doi.org/10.1016/j.optlastec.2025.114354 (2026)
Publications
- L. J. Richter, U. Ross, M. Seibt, J. Ihlemann:
Transmission electron microscopy analysis of UV laser implanted gold nanoparticles and their influence on photoluminescence enhancement from silicon nanocrystals, Discover Nano 20, 82 (2025)
Publications
- J. Holburg, S. Figul, A. Charvat, H. Bluhm, B. Abel, G. Marowsky, D. D. Mai , K. Mann:
Soft X-ray Absorption Spectroscopy with a Flat Liquid Jet in Vacuum Using a Table-Top Laser-Induced Plasma Source, X-Ray Spectrometry, Accepted 2024.
https://doi.org/10.1002/xrs.3474 - Y. Pulnova, T. Parkman, B. Angelov, I. Baranova, A. Zymakova, S. Cipiccia, L. Fardin, R. Antipenkov, D. Peceli, O. Hort, D.-D. Mai, J. Andreasson, J. Nejdl:
Compact laser-driven plasma X-ray source for time-resolved diffraction, spectroscopy, and imaging experiments at ELI Beamlines, Journal of Synchrotron Radiation, submitted for publication 2024. - N. Bakhtiari, J.Ihlemann:
Fabrication of Fluidic Submicron-Channels by Pulsed Laser-Induced Buckling of SiOx Films on Fused Silica
Discover Nano 19, 46 (2024)
Conference constributions
- J. Holburg, A. Ahrens, M. Lübbecke, J. Thieme, S. Figul, G. Marowsky, K. Mann, D. Du Mai:
Table-Top System for High-Resolution Soft X-ray Absorption Spectroscopy, European X-ray Spectrometry Conference (EXRS 2024), Athen, Griechenland. - N. Bakhtiari, J. Ihlemann:
Fabrication of Nanofluidic Channels by Pulsed Laser Irradiation of SiOx-coated Fused Silica
CINSaT Spring Colloquium, Paderborn (03.2024) - N. Bakhtiari, J. Ihlemann:
Fabrication of Nanofluidic Channels by Pulsed Laser Irradiation of SiOx-coated Fused Silica
DPG Frühjahrstagung, Fachverband Oberflächenphysik, Berlin (03.2024) - L. J. Richter, C. M. Beckmann, J. Ihlemann:
Erzeugung schwarzer Markierungen durch UV-Laser Bestrahlung von TiO2-haltigen
handelsüblichen Gläsern, Jahrestagung der Deutschen Gesellschaft für angewandte Optik (DGaO) Aachen (05.2024) - J. Ihlemann, N. Bakhtiari, J. Meinertz, L. J. Richter:
Laser precision microfabrication of optical and fluidic components on the basis of silicon suboxide thin films
25th International Symposium on Laser Precision Microfabrication (LPM2024), San Sebastian, Spain (05.2024) - H. M. Wrigge, Pascal D. Ndione, B. Rethfeld, P. Simon:
Broadband pump probe setup for ultrafast transient reflectivity measurements
COLA 2024, 17th International Conference on Laser Ablation Hersonissos, Crete, Greece (09.2024) - A. Röben, J. Meinertz, J. Ihlemann:
Laserbasierte Spannungskompensation bei Glassubstraten in der Dünnschichttechnologie
F.O.M-Konferenz „GEMEINSAMER FORTSCHRITT DURCH IGF-FORSCHUNG IN OPTIK, PHOTONIK, ANALYSEN- UND MEDIZINTECHNIK“
Berlin (11.2024)
Publications
- E. A. Vishnyakov, D. D. Mai, J. T. Green, A. Mondal, S. Maity, S. Niekrasz, P. Zimmermann, A. Jančárek, A. Y. Molodozhentsev:
Coherent undulator radiation project at ELI Beamlines, Nuclear Inst. and Methods in Physics Research, A, submitted, 2023.
- T. Mazza, T. M. Baumann, R. Boll, A. De Fanis, P. Grychtol, M. Ilchen, J. Montaño, V. Music, Y. Ovcharenko, N. Rennhack, D. E. Rivas, A. Rörig, P. Schmidt, S. Usenko, P. Ziołkowski, D. La Civita, M. Vannoni, H. Sinn, B. Keitel, E. Plönjes, U. F. Jastrow, A. Sorokin, K. Tiedtke, K. Mann, B. Schäfer, N. Breckwoldt, S.-K. Son, M. Meyer:
The beam transport system for the SQS instrument at the European XFEL: optical layout and first commissioning results, J. Synchrotron Rad. (2023).https://doi.org/10.1107/S1600577522012085 - A. M. Summers, S. Severino, M. Reduzzi, T. P. H. Sidiropoulos, D. E. Rivas, N. Di Palo, H.-W. Sun, Y.-H. Chien, I. León, B. Buades, S. L. Cousin, S. M. Teichmann, T. Mey, K. Mann, B. Keitel, E. Plönjes, D. K. Efetov, H. Schwoerer, J. Biegert:
Realizing Attosecond Core-Level X-ray Spectroscopy for the Investigation of Condensed Matter Systems, Ultrafast Science, 3 (2023).
https://spj.science.org/doi/10.34133/ultrafastscience.0004 - C. Britze, P. Henning, M. Vergöhl, A. Pflug, T. Melzig, S. Bruns, B. Schäfer, K. Mann, J. Terhürne:
Precise control and adjustment of uniformity for optical coatings on 2D and 3D components, Surface and Coatings Technology, submitted, 2023. - L. Fütterer, C.M. Beckmann, J. Ihlemann:
Viscoelastic deformation of borosilicate glass substrates induced by a laser-patterned silicon suboxide film
Applied Physics A 129, 107 (2023) - L. J. Richter, U. Ross, M. Seibt, J. Ihlemann:
Excimer laser surface patterning for photoluminescence enhancement of silicon nanocrystals
Photonics 10, 358 (2023) - J. Meinertz, L. J. Richter, C. M. Beckmann, J. Ihlemann:
Precision marking of glass with excimer lasers
PhotonicsViews 2/2023, p. 62 - J. Ihlemann, A. Blumenstein, J.-H. Klein-Wiele, P. Simon:
Periodic Surface Structures by Laser Interference Ablation
in: Ultrafast Laser Nanostructuring – The Pursuit of Extreme Scales, Razvan Stoian, Jörn Bonse eds.
Springer Series in Optical Sciences 239, 495 (2023) - J. Meinertz, L.J. Richter, J. Ihlemann:
Phase masks for laser interference processing
IVAM Hightech-Magazin ››inno‹‹ – Photonics – The Power of Light 84, 4 (2023) - A. Blumenstein, P. Simon, J. Ihlemann:
High-Resolution Laser Interference Ablation and Amorphization of Silicon Nanomaterials 13, 2240 (2023)
Conference contributions
- E. A. Vishnyakov, D. D. Mai, J. T. Green, A. Mondal, A. Jančárek, P. Zimmermann, S. Niekrasz, S. Maity, A. Y. Molodozhentsev:
Compact undulator-based soft X-ray radiation source at ELI Beamlines: user-oriented program, Proceedings of the SPIE, Volume 12582, id. 1258209 10 pp. (2023). - M. Krikunova, Z. Hoque, A. Roos, E. Klimesova, L. B. Ltaief, L. Jurkovičová, O. Hort, O. Finke, M. Albrecht, D. D. Mai, J. Nejdl, M. Mudrich, J. Andreasson:
A multipurpose end-station MAC for applications with intense HHG-based EUV source at ELI Beamlines,
Proceedings Volume PC12582, Compact Radiation Sources from EUV to Gamma-rays: Development and Applications; PC1258205 (2023). https://doi.org/10.1117/12.2666157
- L. Weimann, M. Reinhardt, J. Duda, H. Mißbach-Karmrodt, H. Drake, J. Schönig, J. Holburg, L. B. Andreas, J. Reitner, M. J. Whitehouse, V. Thiel:
Insights Into Carbonaceous Matter in ∼3.5 Ga Hydrothermal Barites from the Dresser Formation (Pilbara Craton, Australia),
European Association of Geoscientists & Engineers, Conference Proceedings, IMOG 2023, Sep 2023, Volume 2023, p.1 – 1 DOI: https://doi.org/10.3997/2214-4609.202333167 - J. Ihlemann, J. Oltmanns, F. Kleinwort, J.-H. Klein-Wiele, P. Simon:
Ultrafast nanostructuring utilizing interference techniques and plasmonic effects
Invited Paper, SPIE Photonics West, Conference 12408 Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVIII, Paper 12408-18, San Francisco, USA (01-02.2023) - L. J. Richter, J. Ihlemann:
Laser implantation of plasmonic nanoparticles for photoluminescence enhancement of silicon quantum dots
SPIE Photonics West, Nanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications San Francisco, USA (01-02.2023) - M. Zhan, V. Oliver, A. Kreiner, H. Wrigge, P. Simon, T. Nagy, A. Guggenmos:
SAVANNA-HP: a stretched flexible hollow-core fiber compressor for high-power lasers
Proc. SPIE PC12414, High-Power Laser Materials Processing: Applications, Diagnostics, and Systems XII, PC1241406 (17 March 2023) - J. Ihlemann, J.-H. Klein-Wiele, F. Kleinwort:
Periodic structures created by laser interference irradiation
Invited Paper, E-MRS Spring meeting, Symposium L, Making light matter: lasers in material sciences and photonics
Strasbourg, France (05-06.2023) - L. J. Richter, C. M. Beckmann, J. Ihlemann:
Black marking of titanium containing commercial glass
Lasers in Manufacturing Conference LiM 2023 München (06.2023) - L. J. Richter, J. Ihlemann:
Laser based Methods for Photoluminescence Enhancement of Silicon Nanocrystals in a Silicon Suboxide Matrix
CLEO Europe, CK – MICRO- AND NANO-PHOTONICS München (06.2023) - A. Röben, C. M. Beckmann, J. Ihlemann:
Laserbasierte Spannungskompensation bei Glassubstraten in der Dünnschichttechnologie (LabaKom)
F.O.M-Konferenz 2023: „FRÜHFÖRDERUNG VON INNOVATIONSIDEEN DURCH IGF IN OPTIK, PHOTONIK, ANALYSEN- UND MEDIZINTECHNIK“
Online (11.2023)
Publications
- J. Holburg, M. Müller, K. Mann, P. Wild, K. Eusterhues, J. Thieme:
High-Resolution Table-Top NEXAFS Spectroscopy, Analytical Chemistry 94, 3510-3516 (2022) - M. Summers, S. Severino, M. Reduzzi, T. P. H. Sidiropoulos, D. Rivas, N. Di Palo, H.-W. Sun, Y.-H. Chien, I. León, B. Buades, S. Cousin, S.M. Teichmann, T. Mey, K. Mann, B. Keitel, E. Plönjes-Palm, D. K. Efetov, H. Schwörer, J. Biegert:
Realizing attosecond core-level X-ray spectroscopy for the investigation of condensed matter and for material science, Ultrafast Science – in press (2022)M. - P. N. Terekhin, J. Oltmanns, A. Blumenstein, D. S. Ivanov, F. Kleinwort, M. E. Garcia, B. Rethfeld, J. Ihlemann, P. Simon:
Key role of surface plasmon polaritons in generation of periodic surface structures following single-pulse laser irradiation of a gold step edge
Nanophotonics 11(2), 359–367 (2022) - C. M. Beckmann, L. J. Richter, J. Ihlemann:
Freeform shaping of fused silica substrates via viscous deformation induced by a laser patterned, stressed film
Optics Express 30, 6726 (2022) - J. Meinertz, A. Gödecke, L. J. Richter, J. Ihlemann:
Fast fabrication of diffractive patterns on glass by excimer laser ablation
Optics and Laser Technology 152, 108148 (2022) - J. Ihlemann, L. J. Richter, J. Meinertz, J. Wunderlich, N. Schindler, A. Günther, B. Oberleiter, T. Rainer:
Glass marking by laser transfer implantation (LTI) of plasmonic nanoparticles
Optics and Laser Technology 155, 108371 (2022) - L. J. Richter, C .M. Beckmann, J. Ihlemann:
UV laser generated micro structured black surface on commercial TiO2-containing glass
Applied Surface Science 601, 154231 (2022) - L. J. Richter, J. Ihlemann:
Photoluminescence enhancement of silicon nanocrystals by excimer laser implanted gold nanoparticles
Applied Physics A 128, 764 (2022) - M. Edakubo, L. J. Richter, Y. Haraguchi, H. Aruga-Katori, J. Ihlemann, G. Miyaji:
Improvement of optical transmittance of SiO2 surface by femtosecond-laser-induced homogeneous nanostructure formation
Optical Materials Express 12, 3982 (2022)
Conference contributions
- L. J. Richter, J. Ihlemann:
Laser based methods for photoluminescence enhancement of silicon nanocrystals
16th International Conference on Laser Ablation COLA 2021/22
Matsue, Japan (04.2022) - M. Edakubo, Y. Haraguchi, H. Aruga-Katori, G. Miyaji, L. J. Richter, J. Ihlemann:
Homogeneous Nanostructures on SiO2 formed with Femtosecond Laser Pulses and Improvement of Optical Transmittance
16th International Conference on Laser Ablation COLA 2021/22
Matsue, Japan (04.2022) - P. N. Terekhin, J. Oltmanns, D.S. Ivanov, F. Kleinwort, M.E. Garcia, J. Ihlemann, P. Simon, B. Rethfeld:
Role of Surface Plasmon Polaritons in Nanophotonics and Nanostructuring
CLEO: Applications and Technology 2022
San Jose, USA (05.2022) - A. Röben, C. Beckmann, J. Ihlemann:
Stress based figure correction and surface-metrology of optical substrates
Humboldt meets Leibniz – Emerging Topics in Optics and Photonics
Hannover (06.2022) - J. Ihlemann, L. J. Richter, C. M. Beckmann, J. Meinertz:
High resolution UV laser marking of glass surfaces
The 23rd International Symposium on Laser Precision Microfabrication – LPM2022
Dresden (06.2022) - C. M. Beckmann, L. Fütterer, L. J. Richter, J. Ihlemann:
Freeform shaping of silicate glass substrates via a viscous deformation and a laser patterned, stressed film
26th International Congress on Glass (ICG)
Berlin (07.2022) - J. Ihlemann, L. J. Richter, C. M. Beckmann, J. Meinertz:
High resolution UV laser marking of glass surfaces
26th International Congress on Glass (ICG)
Berlin (07.2022) - A. Röben, C. M. Beckmann, J. Ihlemann:
Formkorrektur von Glassubstraten in der Dünnschichttechnologie
mittels ArF-Excimer-Laser Bestrahlung
Arbeitskreistreffen des PhotonicNet-AK DUV/VUV-Optik
Alzenau (10.2022) - J. Ihlemann, L. J. Richter, C. M. Beckmann, J. Meinertz:
Laser based fabrication of photonic nanostructures and nanoparticlesCINSaT autumn colloquium
Kassel (11.2022) - C. M. Beckmann, A. Röben, J. Ihlemann:
Laserbasierte Spannungskompensation bei Glassubstraten in der Dünnschichttechnologie
F.O.M.-Konferenz 2022: Gemeinsamer Fortschritt durch IGF-Vorlaufforschung in Optik, Photonik und Medizintechnik
Berlin (11.2022) - J. Meinertz, L. J. Richter, C. M. Beckmann, J. Ihlemann:
UV-Laserbasierte Markierung von Glasoberflächen
Workshop Laserbearbeitung von Glaswerkstoffen
Nürnberg (12.2022)
Publications
- J. Holburg, M. Müller, K. Mann:
„Improved gas-jet based extreme ultraviolet, soft X-ray laser plasma source,“ Optics Express 29, 6620-6628 (2021) - L. J. Richter, C. Beckmann, J. Meinertz, J. Ihlemann:
Fused Silica Phase Masks Enhance Laser Processing and Microscopy, Photonics Spectra, July 2021, p. 56-61 - Simon, J. Ihlemann, J. Bonse:
Editorial: Special Issue “Laser-Generated Periodic Nanostructures”, Nanomaterials 11, 2054 (2021) - J. Oltmanns, P.N. Terekhin, F. Kleinwort, A. Blumenstein, D.S. Ivanov, M.E. Garcia, B. Rethfeld, J. Ihlemann, P. Simon:
Influence of the Laser Beam Shape on Laser-Induced Periodic Surface Structure Formation Assisted by Surface Plasmon Polaritons,JLMN-Journal of Laser Micro/Nanoengineering 16 (3), 199 (2021)
Book contributions
- B. Schäfer, B. Flöter, T. Mey, K. Mann:
Wavefront and coherence characteristics of extreme UV and soft x-ray sources
In: „Nanoscale Photonic Imaging“, Ed. T. Salditt, A. Egner, D.R. Luke, Topics in Applied Physics 134, Springer Open 2021 - M. Müller, K. Mann:
Laboratory-scale Soft X-ray Source for Microscopy and Absorption Spectroscopy
In: „Nanoscale Photonic Imaging“, Ed. T. Salditt, A. Egner, D.R. Luke, Topics in Applied Physics 134, Springer Open 2021 - K. Mann, J. Holburg, M. Müller:
Table-top EUV / Soft X-ray Source for Metrological Applications
SPIE Advanced Lithography, San Jose, USA (02.2021)
Conference constributions
- E. Shestaev, S. Hädrich, N. Walter, T. Nagy, P. Simon, A. Blumenstein, A. Klenke, R. Klas, J. Buldt, H. Stark, M. Gebhardt, S. Breitkopf, C. Gaida, P. Jójárt, I. Seres, Z. Várallyay, Á. Börzsönyi, T. Eidam, J. Limpert:
CEO-stable pulses from a 1kW fiber CPA, Proceedings Volume 11676, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XXI; 116760K (2021) https://doi.org/10.1117/12.2577617, Event: SPIE LASE, 2021, Paper 11676-16, Virtual (03.2021) - P. N. Terekhin, J. Oltmanns, A. Blumenstein, D.S. Ivanov, F. Kleinwort, M. E. Garcia, B. Rethfeld, J. Ihlemann, P. Simon:
Design of periodic structures by surface plasmon polaritons excitation, DPG-Spring meeting on Surface Science, Virtual (03.2021) - J. Oltmanns, P. N. Terekhin, D. S. Ivanov, A. Blumenstein, F. Kleinwort, M. E. Garcia, B. Rethfeld, J. Ihlemann, P. Simon:
Investigation of the plasmonic nature of laser-induced periodic surface structures, The 22nd International Symposium on Laser Precision Microfabrication (LPM 2021), Virtual (06.2021) - L. Fütterer, C. Beckmann, J. Ihlemann:
Viscoelastic deformation of glass substrates by laser patterned stressed films, DPG-Workshop Applied photonics, Bad Honnef (09.2021) - L. J. Richter, J. Ihlemann:
Laser-based methods for luminescence enhancement of Si-nanocrystals by coupling to plasmonic nanoparticles, DPG-Workshop Applied photonics,
Bad Honnef (09.2021) - P. N. Terekhin, F. Kleinwort, J. Oltmanns, A. Blumenstein, D. S. Ivanov, M. E. Garcia, J. Ihlemann, P. Simon, B. Rethfeld:
Evidence of plasmonic nature of self-arranged surface nanostructuring after single femtosecond laser pulse irradiation, DPG-Workshop Applied photonics, Bad Honnef (09.2021)
Publications:
- P. Gollor, M. Schake, S. Tereschenko, K. Roetmann, K. Mann, B. Schäfer, G. Uhlrich, M. Haberland, P. Lehmann:
Kombination eines neuartigen Doppelpuls-RGB-Interferometers mit einem Hartmann-Shack-Wellenfrontsensor zur dynamischen flächenhaften Topographieerfassung
tm – Technisches Messen, Band 87, Heft 9, S. 523–534 (2020) https://doi.org/10.1515/teme-2020-0018 - J.-H. Klein-Wiele, A. Blumenstein, P. Simon, J. Ihlemann:
Laser interference ablation by ultrashort UV laser pulses via diffractive beam management
Advanced Optical Technologies 9, 41 (2020) - J. Meinertz, L.J. Richter, C.M. Beckmann, J. Ihlemann:
Quarzphasenmasken für Mikroskopie und Lasermaterialbearbeitung
Photonik 1.2020, p. 49 - A. Blumenstein, E. S. Zijlstra, D. S. Ivanov, S. T. Weber, T. Zier, F. Kleinwort, B. Rethfeld, J. Ihlemann, P. Simon, M. E. Garcia:
Transient optics of gold during laser irradiation: from first principles to experiment
Physical Review B 101, 165140 (2020) - C.M. Beckmann, J. Ihlemann:
Figure correction of borosilicate glass substrates by nanosecond UV excimer laser irradiation
Optics Express 28, 18681 (2020) - Avakyan, V. Durimanov, D. Nemesh, V. Srabionyan, J. Ihlemann, L. Bugaev:
Theoretical approach for calculation of dielectric functions of plasmonic nanoparticles of noble metals, magnesium and their alloys
Optical Materials 109, 110264 (2020) - Takaya, G. Miyaji, I. Takahashi, L.J. Richter, J. Ihlemann:
Fabrication of periodic nanostructures on silicon suboxide films with plasmonic near-field ablation induced by low-fluence femtosecond laser pulses
Nanomaterials 10, 1495 (2020) - A. Blumenstein, M.E. Garcia, B. Rethfeld, P. Simon, J. Ihlemann, D.S. Ivanov:
Formation of periodic nanoridge patterns by ultrashort single pulse UV laser irradiation of gold
Nanomaterials 10, 1998 (2020) - M. Ouillé, A. Vernier, F. Böhle, M. Bocoum, A. Jullien, M. Lozano, J.-P. Rousseau, Z. Cheng, D. Gustas, A. Blumenstein, P. Simon, S. Haessler, J. Faure, T. Nagy, R. Lopez-Martens:
Relativistic-intensity near-single-cycle light waveforms at kHz repetition rate
Light Sci Appl 9, 47 (2020) https://doi.org/10.1038/s41377-020-0280-5 - K. Oliver Böker, F. Kleinwort, J.-H. Klein-Wiele, P. Simon, K. Jäckle, S. Taheri, W. Lehmann, A. F. Schilling:
Laser Ablated Periodic Nanostructures on Titanium and Steel Implants Influence Adhesion and Osteogenic Differentiation of Mesenchymal Stem
CellsMaterials 2020 13, 3526; doi:10.3390/ma13163526 - T. Nagy, P. Simon, L. Veisz:
High-energy few-cycle pulses: post-compression techniques
Advances in Physics: X, 6:1, 1845795, DOI: 10.1080/23746149.2020.1845795
Book contributions
- B. Schäfer, B. Flöter, T. Mey and K. Mann:
Wavefront and coherence characteristics of extreme UV and soft x-ray sources
In: „Nanoscale Photonic Imaging“, Ed. T. Salditt, A. Egner, D.R. Luke, Topics in Applied Physics 134, Springer Open 2020 - M. Müller and K, Mann:
Laboratory-scale Soft X-ray Source for Microscopy and Absorption Spectroscopy
In: „Nanoscale Photonic Imaging“, Ed. T. Salditt, A. Egner, D.R. Luke, Topics in Applied Physics 134, Springer Open 2020 - K. Mann, J. Holburg, M. Müller:
Table-top EUV / Soft X-ray Source for Metrological Applications
SPIE Advanced Lithography, San Jose, USA (02.2020)
Conference contributions
- C. M. Beckmann, J. Ihlemann:
Figure correction of borosilicate glass substrates by nanosecond UV-laser irradiation
21st International Symposium on Laser Precision Microfabrication (LPM)
Virtual (06.20) - P. Simon, J.-H. Klein-Wiele, A. Blumenstein, J. Ihlemann:
Interference ablation by ultrashort laser pulses via diffractive beam management
21st International Symposium on Laser Precision Microfabrication (LPM)
Invited talk, Virtual (06.20) - J. Ihlemann, J. Meinertz, M. Heinz, T. Fricke-Begemann, M. Dubiel:
UV laser micro processing of doped glass
21st International Symposium on Laser Precision Microfabrication (LPM)
Virtual (06.20) - S. Hädrich, N. Walther, E. Shestaev, T. Nagy, P. Simon, A. Blumenstein, R. Klas, J. Buldt, H. Stark, S. Breitkopf, P. Jójárt, I. Seres, Z. Várallyay, Á. Börzsönyi, T. Eidam, J. Limpert:
High Pulse Energy CEP-stable Few-cycle Pulses at High Average Power: Status of the ELI-ALPS HR2 System
High-brightness Sources and Light-driven Interactions Congress, HILAS, OSA Virtual Event, paper HTh3B.2 (11.20) - T. Nagy, S. Hädrich, P. Simon, A. Blumenstein, N. Walther, R. Klas, J. Buldt, H. Stark, S. Breitkopf, P. Jójárt, I. Seres, Z. Várallyay, T. Eidam, J. Limpert:
Pulse compression to 3-cycle duration beyond 300 W average power
Conference on Lasers and Electro-Optics, CLEO 2020, invited paper SM2H. - S. Hädrich, N. Walther, M. Kienel, P. Simon, T. Nagy, A. Blumenstein, E. Shestaev, R. Klas, J. Buldt, L.-H. Stark, S. Breitkopf, P. Jójárt, Z. Várallyay, K. Osvay, T. Eidam, J. Limpert:
500W, 5mJ, 6fs, CEP-stable few-cycle pulses. An update on the ELI-ALPS HR2 beamline
Fiber Lasers XVII: Technology and Systems, San Francisco, USA, (Invited Talk, Paper 11260-7) (02.20)
Publications
- J. Holburg, M. Müller, K. Mann, S. Wieneke:
Brilliance improvement of laser-produced extreme ultraviolet and soft x-ray plasmas based on pulsed gas jets, Journal of Vacuum Science & Technology A 37, 031303 (2019) - M. Müller, M. Schellhorn, K. Mann:
Laboratory-scale near-edge X-ray absorption fine structure spectroscopy with a laser-induced plasma source, Journal of Analytical Atomic Spectrometry, 34, 1779 (2019) - V.V. Srabionyan, M. Heinz, S. Y. Kaptelinin, L. A. Avakyan, G. B. Sukharina, A.V. Skidanenko, V.V. Pryadchenko, K. G. Abdulvakhidov, A. S. Mikheykin, V.A. Durymanov, J. Meinertz, J. Ihlemann, M. Dubiel, L. A. Bugaev:
Effect of thermal post-treatment on surface plasmon resonance characteristics of gold nanoparticles formed in glass by UV laser irradiation,
Journal of Alloys and Compounds 803, 354 (2019) - L. J. Richter, C. Beckmann, J. Meinertz, J. Ihlemann:
Fabrication of Multilevel Fused Silica Diffractive Phase Elements by Laser Processing of Silicon Suboxide,
DGaO-Proceedings A32 (2019) - J. Meinertz, J. Ihlemann:
Effiziente diffraktive Markierung von Glasoberflächen mittels ArF-Excimerlaser,
DGaO-Proceedings P30 (2019) - J.-H. Klein-Wiele, T. Fricke-Begemann, P. Simon, J. Ihlemann:
Complex diffractive surface patterns on metals by UV-ps laser ablation,
Optics Express 27, 28902 (2019) - S. Rung, K. Bokan, F. Kleinwort, S. Schwarz, P. Simon, J.-H. Klein-Wiele, C. Esen, R. Hellmann:
“Possibilities of Dry and Lubricated Friction Modification Enabled by Different Ultrashort Laser-Based Surface Structuring Methods”,
Lubricants 7, 43 (2019) - N. G. Khodakovskiy, M. P. Kalashnikov, V. Pajer, A. Blumenstein, P. Simon, M. M. Toktamis, M. Lozano, B. Mercier, Z. Cheng, T. Nagy, R. Lopez-Martens:
“Generation of few-cycle laser pulses with high temporal contrast via nonlinear elliptical polarisation rotation in a hollow fibre compressor”,
Laser Phys. Lett. 16 095001 (2019) - T. Nagy, S. Hädrich, P. Simon, A. Blumenstein, N. Walther, R. Klas, J. Buldt, H. Stark, S. Breitkopf, P. Jójárt, I. Seres, Z. Várallyay, T. Eidam, J. Limpert:
Generation of three-cycle multi-millijoule laser pulses at 318 W average power,
Optica 6, 1423 (2019)
Conference contributions
- N. G. Khodakovskiy, M. P. Kalashnikov, B. Mercier, V. Pajer, Z. Cheng, M. Lozano, A. Blumenstein, P. Simon, T. Nagy, R. Lopez-Martens:
“High-fidelity few-cycle laser pulses generated via nonlinear ellipse rotation”, Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC 2019, Münich, Germany, 23-27 June 2019, DOI: 10.1109/CLEOE-EQEC.2019.8873203, (poster, CF-P40 SUN) - S. Hädrich, P. Simon, T. Nagy, A. Blumenstein, R. Klas, J. Buldt, L.-H. Stark, S. Breitkopf, P. Jójárt, Z. Várallyay, K. Osvay, T. Eidam, J. Limpert:
“Spectral Broadening of a 500W, 5mJ Femtosecond Laser”, Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC) 2019, DOI: 10.1109/CLEOE-EQEC.2019.8873189 - J. Ihlemann, A. Blumenstein, F. Kleinwort, J. Oltmanns, D.S. Ivanov, P.N.Terekhin, B. Rethfeld, M. E. Garcia, P. Simon:
Generation of deterministic nanostructures with ultrashort UV pulses under predefined interface boundary conditions,
W05,06-2, INTERNATIONAL SYMPOSIUM: FUNDAMENTALS OF LASER ASSISTED MICRO-&NANOTECHNOLOGIES, FLAMN 2019, Saint-Petersburg, Russia - S. Hädrich, P. Simon, T. Nagy, A. Blumenstein, R. Klas, J. Buldt, L.-H. Stark, S. Breitkopf, P. Jójárt, Z. Várallyay, K. Osvay, T. Eidam, J. Limpert:
“Spectral Broadening of a 500W, 5mJ Femtosecond Laser”, 7th International Conference on Attosecond Science and Technology, Atto 2019, Szeged, Hungary - A. Blumenstein, D.S. Ivanov, E. S. Zijlstra, M .E. Garcia, B. Rethfeld, J. Ihlemann, P. Simon:
Gold Surface Nanostructuring with Ultrashort Laser Pulses – Study of Non-equilibrium Effects, FemtoMat 2019, Femtomat, March 18–20, 2019, Mauterndorf Castle, Mauterndorf, Salzburg, Austria - S. Hädrich, P. Simon, T. Nagy, A. Blumenstein, N. Walther, M. Kienel, E.Shestaev, F. Stutzki, C. Gaida, S. Breitkopf, P. Jójárt, Z. Várallyay, K. Osvay, T. Eida, J. Limpert:
3.2-mJ sub-10-fs pulses at 100 kHz Advanced Solid State Laser Conference 2019, Vienna, Austria, 29 September- 3 October 2019, (postdeadline talk, ATu6A.2) - S. Breitkopf, S. Hädrich, M. Kienel, P. Jójárt, Z. Várallyay, K. Osvay, .P. Simon, T. Nagy, A. Blumenstein, R. Klas, J. Buldt, L.-H. Stark, E. Shestaev , T. Eidam, J. Limpert:
Yb-doped fiber laser system with 1kW, 10mJ and <300fs pulse for the generation of TW class few-cycle pulses, Ultrafast Optics XII 2019, Bol, Croatia, 6-11 October 2019, (regular talk, TU8.4)
Publications
- I. A. Makhotkin, R. Sobierajski, J. Chalupský, K. Tiedtke, G. de Vries, M. Störmer, F. Scholze, F. Siewert, R. W. E. van de Kruijs, I. Milov, E. Louis, I. Jacyna, M. Jurek, D. Klinger, L. Nittler, Y. Syryanyy, L. Juha, V. Hájková, V. Vozda, T. Burian, K. Saksl, B. Faatz, B. Keitel, E. Plönjes, S. Schreiber, S. Toleikis, R. Loch, M. Hermann, S. Strobel, H.-K. Nienhuys, G. Gwalt, T. Mey, H. Enkisch:
„Experimental study of EUV-mirror radiation damage resistance under long term FEL exposures below the single shot damage threshold“ J. Synchrotron Rad. 25, 77-84 (2018) - M. Heinz, V.V. Srabionyan, L.A. Avakyan, A.L. Bugaev,
A.V. Skidanenko, V.V. Pryadchenko, J. Ihlemann, J. Meinertz, C. Patzig, M. Dubiel, L.A. Bugaev:
Formation and implantation of gold nanoparticles by ArF-excimer laser irradiation of gold-coated float glass,
Journal of Alloys and Compounds 736, 152 (2018) - L. Avakyan, M. Heinz, A. Skidanenko, K. A. Yablunovskiy, J. Ihlemann, J. Meinertz, C. Patzig, M. Dubiel, L. Bugaev:
Insight on agglomerates of gold nanoparticles in glass based on surface plasmon resonance spectrum: Study by multi-spheres T‑matrix method,
Journal of Physics: Condensed Matter 30, 045901 (2018) - N. Wang, T. Fricke-Begemann, P. Peretzki, J. Ihlemann, M. Seibt:
Formation of porous silicon oxide from substrate-bound silicon rich silicon oxide layers by continuous-wave laser irradiation,
Journal of Applied Physics 123, 093104 (2018)
Conference constributions
- K. Mann, U. Leinhos, M. Lübbecke, B. Schäfer:
Characterization of absorptance and thermally induced wavefront deformations in DUV lithography optics SPIE Advanced Lithography, San Jose / USA (02.2018) - M. Schellhorn, M. Müller, K. Mann:
Implementation of an in situ liquid-flow unit for tabletop NEXAFS spectroscopy SFB 755 Spring School, Kloster Drübeck (04.2018) - C. Fotso Kwamou, A. Fischer, F. Scholze, K. Mann, B. Schäfer:
Using a wavefront sensor to optimise the alignment of beamline optics Synchrotron Radiation Instrumentation (SRI 2018), Taipeh/Taiwan (06.2018) - M. Vergöhl, C. Britze, S. Bruns, J. Ahrens, B. Schäfer, K. Mann, V. Kirschner:
Development of a broadband dielectric beam splitter with reduced spectral wavefront error SPIE Optical Systems Design, Conference “Advances in Optical Thin Films”, Frankfurt, Deutschland (06.2018) - K. Mann, B. Schäfer, J. Zimara, M. Vergöhl, C. Britze, S. Bruns, V. Kirschner:
Spectrally resolved wavefront measurements on broad-band dielectric coatings, SPIE Laser Damage Symposium, Boulder, USA (09.2018) - K. Mann, B. Schäfer:
Non-linear wavefront distortion in high power laser optics COST Action CA17126, 1st General Meeting, Madrid / Spanien (11.2018) - L. J. Richter, C. Beckmann, J. Meinertz, J. Ihlemann:
Laser processing of silicon suboxide for the fabrication of diffractive phase elements,
DPG Frühjahrstagung, Fachverband Kurzzeit- und angewandte Laserphysik
Erlangen (03.2018) - J. Ihlemann:
Laser processing of silicon suboxide (SiOx) – from the generation of Si-nanocrystals to the fabrication of diffractive phase elements,
International Workshop on Frontiers in Lasers and Applications (FLA 2018)
Okinawa, Japan (04.2018) - L. J. Richter, C. M. Beckmann, J. Meinertz, J. Ihlemann:
Laser processing of silicon suboxide for the fabrication of multilevel fused silica diffractive phase elements,
19th International Symposium on Laser Precision Microfabrication (LPM 2018)
Edinburgh, UK (06.2018)
Publications
- M. Stubenvoll, B. Schäfer, K. Mann:
Passive compensation of laser-induced higher-order aberrations in high-power NIR optics, Optics Express 25(21), 25407 (2017) - P. Vrba, M. Vrbova, M. Müller, K. Mann, D. Panek, T. Parkman:
Picosecond Laser Krypton Plasma Emission in Water Window Spectral Range, Physics of Plasma (submitted) - M. Mehrjoo, K. Giewekemeyer, P. Vagovic, S. Stern, R. Bean, M. Messerschmidt, B. Keitel, E. Plönjes, M. Kuhlmann, T. Mey, E. Schneidmiller, M. Yurkov, T. Limberg, A. Mancuso:
Single-shot determination of focused FEL wave fields using iterative phase retrieval, Optics Express, 25, 15, 17892 (2017) - L. Shi, B. Iwan, R. Nicolas, Q. Ripault, J.R.C. Andrade, S. Han, H. Kim, W. Boutu, D. Franz,
T. Heidenblut, C. Reinhardt, B. Bastiaens, T. Nagy, I. Babushkin, U. Morgner, S. Kim,
G. Steinmeyer, H. Merdji, M. Kovacev:
Self-optimization of plasmonic nanoantennas in strong femtosecond fields, Optica 4, 1038-1043 (2017) - N. Wang, T. Fricke-Begemann, P. Peretzki, K. Thiel, J. Ihlemann, M. Seibt:
Microstructural analysis of the modifications in substrate-bound silicon-rich silicon oxide induced by continuous wave laser irradiation,Journal of Alloys and Compounds 707, 227 (2017) - M. Heinz, M. Dubiel, J. Meinertz, J. Ihlemann, A. Hoell:
Investigation of gold and bimetallic gold/silver nanoparticles in soda-lime-silicate glasses formed by means of excimer laser irradiation, Proc. SPIE 10093, 100930I (2017) - D. S. Ivanov, A. Blumenstein, J. Ihlemann, P. Simon, M. E. Garcia,·B. Rethfeld:
Molecular dynamics modeling of periodic nanostructuring of metals with a short UV laser pulse under spatial confinement by a water layer, Applied Physics A 123, 744 (2017)Konferenzbeiträge
- T. Mey, B. Schäfer, B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann:
Wigner distribution measurement of the spatial coherence properties of FLASH, DESY Users’ Meeting, Hamburg (01.2017) - M. Müller:
Spectro-microscopy with a compact laser-driven soft x-ray source, SFB 755 Winter School “Nanoscale Photonic Imaging”, Hirschegg, Österreich (02.2017) - J. Holburg, M. Müller:
Soft x-ray spectro-microscopy with a lab-scale source, Poster, SFB 755 Winter School “Nanoscale Photonic Imaging”, Hirschegg, Österreich (02.2017) - I. Milov, I. Makhotkin, R. Sobierajski, H. Enkisch, K. Tiedtke, G. de Vries, F. Scholze, E. Louis, L. Juha, B. Keitel, E. Plönjes-Palm, T. Mey, K. Mann et al.:
Single-shot damage of Ru thin film induced by XUV FEL fs pulses, Damage to VUV, EUV, and X-ray Optics (XDam6), SPIE Conf. Optics + Optoelectronics, Prag, Tschechien (04.2017) - I. Makhotkin, K. Tiedtke, M. Störmer, F. Siewert, K. Mann, E. Louis, L. Juha, E. Plönjes-Palm, T. Mey,
H. Enkisch et al.:
Irradiation of EUV-mirrors with multiple FEL pulses below the single shot damage threshold, Damage to VUV, EUV, and X-ray Optics (XDam6), SPIE Conf. Optics + Optoelectronics, Prag, Tschechien (04.2017) - K. Mann:
Absorption und Wellenfrontdeformation in optischen Hochleistungskomponenten, ZIM-Netzwerk-Treffen „Photonische Prozesskette & Industrie 4.0“ (OPTILIZE I4.0), Fa. Leica / Wetzlar, eingel. Vortrag (08.2017) - P. Simon, A. Blumenstein, F. Kleinwort, J. Ihlemann, B. Rethfeld, D.S. Ivanov, M. E. Garcia:
Nano-structure formation on gold and silicon surfaces by laser irradiation, FemtoMat 2017, Mauterndorf, Austria March 2017 (invited talk) - A. Blumenstein, D. S. Ivanov, M. E. Garcia, B. Rethfeld, P. Simon, J. Ihlemann:
Nano ridge formation by ultrashort UV laser irradiation of gold International Conference on Laser Ablation (COLA), Marseille (09.2017) - J. Meinertz, R. Karstens, H. Stark, J. Ihlemann:
Periodic patterning of glass by phase mask projection International Conference on Laser Ablation (COLA), Marseille (09.2017) - T. Fricke-Begemann, K. Rewerts, N. Wang, P. Peretzki, C. Gobert, M. Seibt, J. Ihlemann:
Laser annealing of SiOx films for the generation of luminescent silicon nanoclusters and nanocrystals International Conference on Laser Ablation (COLA), Marseille (09.2017) - J. Ihlemann:
DUV/VUV-Laser-Mikrobearbeitung transparenter Materialien PhotonicNet Arbeitskreistreffen DUV-VUV Göttingen (11.2017) J. Ihlemann:
UV-Laser-Mikro- und Nanostrukturierung von Glas Workshop Laserbearbeitung von Glaswerkstoffen, Nürnberg (12.2017) - D. Tasche, C. Gerhard, J. Ihlemann, W. Viöl:
Einfluss des Wasserstoffgehaltes und Stöchiometrieverhältnisses von O und Si auf die Excimerlaserablation von Quarzglas,
18. Fachtagung für Plasmatechnologie PT-18, Göttingen (02.2017) - C. Gobert, N. Wang, T. Fricke-Begemann, J. Ihlemann, M. Seibt:
Micro-Raman spectroscopy of laser-annealed reheated SiOxfilms on silica substrate,
DPG-Frühjahrstagung, Dresden (03.2017) - M. Heinz, M. Dubiel, L. Avakyan, A. Bugaev, L. Bugaev, J. Ihlemann, J. Meinertz:
ArF-excimer laser irradiation of gold coated float glass – formation and implantation of gold nanoparticles,
DPG-Frühjahrstagung, Dresden (03.2017) - M. Heinz, M. Dubiel, J. Meinertz, J. Ihlemann, A. Hoell:
Investigation of gold and bimetallic gold/silver nanoparticles in soda-lime-silicate glasses formed by means of excimer laser irradiation, Synthesis and Photonics of Nanoscale Materials XIV, Photonics West San Francisco (01.2017) - D. S . Ivanov, A. Blumenstein, M. E. Garcia, B. Rethfeld, J. Ihlemann, P. Simon:
Theoretical investigation of periodic nanostructuring mechanism of Au due to UV laser pulse with and without spatial confinement, E-MRS, Spring meeting Strasbourg (05.2017) - J. Ihlemann:
Micro- and Nanopatterning of Surfaces by Short and Ultrashort UV Laser Pulses PhotonicNet-Symposium: Surface Processing,
Göttingen (06.2017) - F. Boehle, A. Blumenstein, A. Vernier, A. Jullien, M. Kretschmar, M. Kovacs, R. Romero, H. Crespo,
P. Simon, T. Nagy, R. Lopez-Martens:
Relativistic-intensity near-single-cycle pulses from a stretched hollow-fiber compressor at 1kHz, SPIE Optics & Optoelectronics 2017, Prague-Czech Republic, 24-27 April 2017 - F. Boehle, A. Blumenstein, M. Bocoum, A. Vernier, M. Lozano, J.-P. Rousseau, A. Jullien, D. Gustas,
D. Guénot, J. Faure, M. Kovacs, M. Kretschmar, P. Simon, U. Morgner, T. Nagy, R. Lopez-Martens:
Relativistic-intensity 1.3 optical cycle laser pulses at 1kHz from a stretched hollow-fiber compressor,
CLEO/QELS 2017, San Jose (CA) USA, 14-19 May 2017 - F. Boehle, A. Blumenstein, M. Bocoum, A. Vernier, M. Lozano, J.-P. Rousseau, A. Jullien, D. Gustas,
D. Guénot , J. Faure , M. Kretschmar, P. Simon , T. Nagy, R. Lopez-Martens:
Relativistic plasma mirrors at 1kHz, TARG3: Targetry for high repetition rate laser-driven sources,
Salamanca-Spain, 21-23 June 2017 - F. Böhle, M. Bocoum, A. Vernier, M. Lozano, J.-P. Rousseau, A. Jullien, D. Gustas, D. Guénot,
J. Faure, M. Kovacs, M. Kretschmar, P. Simon, U. Morgner, T. Nagy, R. Lopez-Martens:
Relativistic-Intensity 1.3 Optical Cycle Laser Pulses at 1kHz from a Stretched Hollow-Core-Fiber Compressor,
CLEO Europe 2017, Munich-Germany, 25-29 June 2017 - F. Boehle, A. Blumenstein, M. Bocoum, A. Vernier, M. Lozano, J.-P. Rousseau, A. Jullien, D. Gustas,
D. Guénot, J. Faure, M. Kovacs, M. Kretschmar, P. Simon, U. Morgner, T. Nagy, R. Lopez-Martens:
Relativistic-intensity near-single-cycle laser pulses at 1kHz, Ultrafast Optics XI, Jackson Hole (WY) USA, 8-13 October 2017 - P. Simon, A. Blumenstein, F. Kleinwort, J. Ihlemann, B. Rethfeld, D.S. Ivanov, M. e. Garcia:
„Nano-structure formation on gold and silicon surfaces by laser irradiation“, FemtoMat 2017, Mauterndorf, Austria, March 2017 (invited talk)
Publications
- F. Döring, H. Ulrichs, S. Pagel, M. Müller, M. Mansurova, M. Müller, C. Eberl, T. Erichsen,
D. Huebner, P. Vana, K. Mann, M. Münzenberg, H.-U. Krebs:
“Confinement of phonon propagatipn in laser deposited Tungsten/Polycarbonate multilayers”,
New J. Phys.18 (2016)
- F.- C. Kühl, M. Müller, M. Schellhorn, K. Mann, S. Wieneke, K. Eusterhues:
“Near-edge x-ray absorption fine structure spectroscopy at atmospheric pressure with a table-top laser-induced soft x-ray source” ,
J. Vac. Sci. Technol. A 34 (2016)
- M. Müller, T. Mey, J. Niemeyer, M. Lorenz, K. Mann:
“Table-to Soft X-ray Microscopy with a Laser-induced Plasma Source Based on a Pulsed Gas-jet“,
AIP Conf. Proc. 1764 (2016)
- M. Stubenvoll, B. Schäfer, K. Mann, O. Novak:
“Photothermal method for absorption measurements in anisotropic crystals”,
Rev. Sci. Instrum. 87, 023904 (2016)
- B. Keitel, E. Plönjes, S. Kreis, M. Kuhlmann, K. Tiedtke, T. Mey, B. Schäfer, K. Mann:
„Hartmann wavefront sensors and their application at FLASH“,
J. Synchrotron Rad. 23, 43–49 (2016)
- M. Nikl, V. Babin, J. Pejchal, V.V. Laguta, M. Buryi, J.A. Mares, K. Kamada, S. Kurosawa, A. Yoshikawa, D. Panek, P. Bruza, K. Mann, M. Müller:
The stable Ce4+ center: a new tool to optimize Ce-doped oxide scintillators,
IEEE Transactions on Nuclear Science, VOL. 63, NO. 2, 433 (2016)
Conference constributions
- M. Müller:
Table-top XANES spectroscopy and soft x-ray microscopy with a laser-induced plasma source,
International Symposium “Biological Dynamics from Microscopic to Mesoscopic Scales”, Grimma (02.2016)
- B. Schäfer:
Strahl- und Optikcharakterisierung für Anwendungen in der Laser-Material-Bearbeitung,
DPG Frühjahrstagung, Hannover (02.2016)
- B. Schäfer:
Absorption und laserinduzierte Wellenfrontdeformation in optischen Komponenten,
PhotonikNet Workshop “Laserstrahlpropagation durch Hochleistungsoptiken”, LLG / Göttingen (03.2016)
- T. Mey:
Propagationseigenschaften von Laserstrahlung PhotonikNet Workshop “Laserstrahlpropagation durch Hochleistungsoptiken”,
LLG / Göttingen (03.2016)
- K. Mann:
Characterization of Wavefront and Coherence properties of EUV Sources,
SPIE Conf. “Advanced Lithography”, San Jose / USA (02.2016)
- K. Mann:
Characterization of Wavefront and Coherence properties of High Power Laser Sources,
ELI Prag / CZ, eingel. Vortrag (03.2016)
- M. Müller:
Soft x-ray spectro-microscopy with a lab-scale source,
SFB 755 Autumn School “Nanoscale Photonic Imaging”, Göttingen (10.2016)
- T. Mey:
Coherence properties of free-electron lasers Workshop on Wavefront Sensors,
(PUCCA), ESRF Grenoble / Frankreich, eingel. Vortrag (05.2016)
- K. Mann:
Vom tiefen UV- in den Röntgenbereich: Überblick über aktuelle Arbeiten der Abt. Optik – Kurze Wellenlängen,
Auswärtsseminar der Hochschule Zwickau, eingel. Vortrag (09.2016)
- K. Mann:
Applications of laser-driven soft x-ray sources and beam characterization at short wavelengths,
COST Action MP1203, Athens / Greece (09.2016)
- K. Mann:
Absorption, Wellenfrontdeformation und Fokusshift in optischen Hochleistungs-Komponenten,
DUV/VUV-Workshop, Fa. Berliner Glas (10.2016) - B. Schäfer:
Experimental setup for measurement of the Wigner distribution and their influence on the determination of beam parameters, wavefront and spatial coherence,
SFB 755 Autumn School “Nanoscale Photonic Imaging”, Göttingen (10.2016)
- M. Müller:
Soft x-ray spectro-microscopy with a lab-scale source,
SFB 755 Autumn School “Nanoscale Photonic Imaging”, Göttingen (10.2016)
- K. Mann:
Applications of a Table-top Laser Driven EUV/Soft X-ray Source and Wavefront Optimization at Short Wavelengths,
Int. Workshop on EUV and Soft X-Ray Sources, Amsterdam / NL, eingel. Vortrag (11.2016)
- U. Leinhos, K. Mann:
Optical metrology and loss mechansims in the UV-spectral range,
Optimax Systems Inc, Ontario, NY/USA, eingel. Vortrag (11.2016)
- T. Mey, B. Schäfer, B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann:
Wigner distribution measurement of the spatial coherence properties of FLASH DESY Users’ Meeting, Hamburg (01.2016)
- U. Leinhos, B. Schäfer, M. Stubenvoll, K. Mann:
Absorption and wavefront deformations in high power laser optics,
Boulder Damage Symposium, Boulder/USA (09.2016)
Book constributions
- T. Mey:
Brilliance Improvement of a Laser-Produced Soft X-Ray Plasma In: High Energy and Short Pulse Lasers,
Dr. Richard Viskup (Ed.) DOI: 10.5772/64149 (2016)
Publications
- T. Mey, S. Zayko, C. Ropers, B. Schäfer, K. Mann:
Toroidal grating astigmatism of high-harmonics characterized by EUV Hartmann sensor.
Optics Express 23, No. 12, 15310 (2015) DOI: 10.1364/OE.23.015310 - O. Novák, T. Miura, M. Smrž, M. Chyla, S. Nagisetty, J. Mužík, J. Linnemann,
H. Turčičová, V. Jambunathan, O. Slezák, J. Huynh, P. Severová, P. Navrátil,
D. Vojna, L. Horáčková, K. Mann, A. Lucianetti, A. Endo, D. Rostohar, T. Mocek:
Status of the High Average Power Diode-Pumped Solid State Laser Development at HiLASE Applied Sciences 5(4), 637-665 (2015) DOI:10.3390/app5040637 - D. Köhne, T. Fricke-Begemann, R. Weichenhain-Schriever, J. Ihlemann:
Large area silica nano grids by homogeneous high resolution laser patterning of SiOx-films,
Journal of Laser Micro/Nanoengineering 10, 158 (2015)
Conference contributions
- T. Mey:
Wigner distribution measurement of the spatial coherence properties of FLASH,
Users Meeting 2015 des DESY, Hamburg (01.2015) - K. Mann:
Wellenfront-Messtechnik zur Charakterisierung von Optiken und Laserstrahlung,
DPG-Frühjahrstagung, Bochum (03.2015) - K. Mann:
Messung von Absorptionsverlusten inoptischen Hochleistungskomponenten SPECTARIS Workshop “Qualitätssicherung von Hochleistungs-Laseroptiken”,
Wetzlar, eingel. Vortrag (03.2015) - K. Mann:
Table-top LPP source for spectroscopic and microscopic applications in the water window,
EUV Workshop at HiLase, Prag, eingel. Vortrag (04.2015) - K. Mann:
Table-top EUV/Soft X-ray Source and Wavefront Measurements at Short Wavelengths COST,
Workshop MP1203, Jena (04.2015) - K. Mann:
Wavefront metrology and beam characterization in the EUV/soft X-ray spectral range,
2nd Swedish-German Workshop on X-Ray Optics, HZB Berlin-Adlershof, eingel. Vortrag (04.2015) - T. Mey:
Coherence properties of free-electron,
lasers Workshop “PhotonDiag2015”, Triest, Italien (06.2015) - K. Mann:
Applications of laser-driven EUV/soft X-ray sources and wavefront measurements at short wavelengths,
Laserlab Europe Workshop ALPS2015, Warschau, eingel. Vortrag (07.2015) - T. Mey:
Wigner distribution measurement of the spatial coherence properties of FELs,
SPIE Optics + Photonics, San Diego, USA (08.2015) - M. Müller:
Table-top NEXAFS spectroscopy and soft x-ray microscopy with a laser-induced plasma source ICXOM23,
Brookhaven National Laboratory, USA (09.2015) - K. Mann:
Erzeugung und Anwendung von weicher Röntgenstrahlung aus laser-induzierten Plasmen,
Auswärtsseminar Hochschule Zwickau, Vogtland (09.2015) - T. Mey:
Beam diagnostics at EUV wavelengths,
290. PTB-Seminar “VUV and EUV Metrology”, Berlin (11.2015) - K. Mann:
Absorption, Wellenfrontdeformation und Fokusshift in optischen Hochleistungs-Komponenten,
Optence Workshop, Bad Kreuznach, eingel. Vortrag (11.2015) - T. Mey, B. Schäfer, B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann:
Wigner distribution measurement of the spatial coherence properties of FLASH,
DESY Users’ Meeting, Hamburg (01.2015) - C. Thiel, M. Stubenvoll, B. Schäfer, T. Krol:
Reliable Beam Positioning for Metal-based Additive Manufacturing by Means of Focal Shift,
Reduction Lasers in Manufacturing Conference, München (06.2015) - K. Mann, B. Schäfer, M. Stubenvoll, K. Hentschel, M. Zenz:
Measurement and compensation of wavefront deformations and focal shifts in high power laser optics,
Boulder Damage Symposium, Boulder /USA (09.2015) - O. Novák, K. Mann, A. Endo, T. Mocek et al.:
Time-resolved deformation measurement of Yb:YAG thin disk using wavefront sensor,
Photonics West, San Francisco (01.2015)
Buchbeiträge
- K. Mann:
Lithography in the Deep Ultraviolet and Extreme Ultraviolet in: Laser-Induced Damage in Optical Materials,
Ed. D. Ristau, pp. 475 – 495, Taylor&Francis, 2015 - K. Mann:
Near-Edge X-ray Absorption Fine Structure Measurements Using a Laboratory-Scale XUV Source,
in: Short Wavelength Laboratory Sources: Principles and Practices, pp. 407-413, 2015 - M. Krämer, K. Mann:
Broadband Multilayers:Tailor Made Mirrors for Linearly Polarized X-rays from a Laser Plasma Source,
in: Short Wavelength Laboratory Sources: Principles and Practices, pp. 326-332, 2015 - J. Hyyti, M. Hofmann, S. Birkholz, M. Bock, S.K. Das, R. Grunwald, M. Hoffmann, T. Nagy, A. Demircan, M. Jupé, D. Ristau, U. Morgner, C. Brée, M. Woerner, T. Elsaesser, G. Steinmeyer:
Non-Instantaneous Polarization Dynamics in Resonant Dielectrics, CLEO/Europe-EQEC 2015 Münich, Germany (regular talk, EE-5b.2 MON)
Publications
- T. Mey, B. Schäfer, K. Mann , B. Keitel, M. Kuhlmann, E. Plönjes:
Wigner distribution measurements of the spatial coherence properties of the free-electron laser FLASH, Optics Express 22, No. 13, 16571, http://dx.doi.org/10.1364/OE.22.016571, (2014) - M. Müller, T. Mey, J. Niemeyer, K. Mann:
„Table-top soft X-ray microscope using laser-induced plasma from a pulsed gas jet“, Opt. Express 22 023489, (2014) - C. Liberatore, K. Mann, M. Müller, L. Pina, L. Juha, L. Vysin, J. Rocca, A. Endo, T. Mocek:
„Short-wavelength ablation of polymers in the high-fluence regime „, Phys. Scr. 2014, 014066, (2014) - M. Stubenvoll, B. Schäfer, K. Mann:
Measurement and compensation of laser-induced wavefront deformations and focal shifts in near IR optics, Opt. Expr. 22, 25385-25396 (2014) - T. Mey, B. Schäfer, K. Mann:
Measurement of the Wigner distribution function of non-separable laser beams employing a toroidal mirror New Journal of Physics 16, 123042 (2014) - C. Liberatore, K. Mann, M. Müller, L. Pina, L. Juha, L. Vyšín, J. J. Rocca, A. Endo, T. Mocek:
Short-wavelength ablation of polymers in the high-fluence regime Physica Scripta 2014, 014066 (2014) - J. Bekesi, P. Simon, J. Ihlemann:
Deterministic sub-micron 2D grating structures on steel by UV-fs-laser interference patterning, Appl. Phys. A 114, 69 (2014)
Conference contributions
- K. Mann:
Table-top EUV/Soft X-ray source for metrological applications Akad. d. Wissenschaften / HiLase, Prag, eingel. Vortrag (02.2014) - K. Mann:
Table-top EUV/Soft X-ray Source and Wavefront Measurements at Short Wavelengths SPIE Conf. „Advanced Lithography“ San Jose/USA (02.2014) - K. Mann:
Absorption and wavefront deformations in high power laser optics Sino-German Symp. „Characterization of Laser Components“, Laser Zentrum Hannover (05.2014) - K. Mann:
Stabilität optischer Komponenten für UV-Laser Bayern Photonik Workshop „UV-Laser“, Nürnberg, eingel. Vortrag (07.2014) - K. Mann:
Wellenfront-Messtechnik zur Charakterisierung von Optiken und Laserstrahlung PhotonicNet Workshop „Technische Optik in der Praxis“, Göttingen, eingel. Vortrag (09.2014) - K. Mann:
Absorptance, thermal lensing and damage testing in optical materials for DUV, EUV and x-ray radiation COST meeting, Lissabon (09.2014)
- K. Mann:
Wavefront metrology for optics and laser beam characterization Int. Conf. on Optics, Photonics & Photosciences (CIOFF), Havanna/Kuba eingel. Vortrag (10.2014) - K. Mann:
Messung und Kompensation von Wellenfront-Deformationen und Fokusshift in NIR-Optiken Bayern Photonik Workshop „Thermische Linsen“, Nürnberg, eingel. Vortrag (12.2014) - B. Schäfer:
Beam wavefront and spatial coherence from the Wigner distribution function COST meeting, Bern (03.2014) - M. Müller:
Applications of a table-top laser-induced plasma source emitting in the soft x-ray range. Institutskolloquium Laser-Laboratorium Göttingen e.V. (03. 2014) - M. Müller:
NEXAFS spectroscopy and imaging performance of a soft x-ray microscope using a table-top laser-induced plasma source. DPG-Frühjahrstagung, Berlin (03. 2014) - M. Müller:
Soft x-ray microscopy and NEXAFS spectroscopy using a table-top laser-induced plasma source based on a pulsed gas jet. 2nd BOX Workshop (part of the BIO-OPT-XUV European Project), Kladno/Czech Republic (05. 2014) - M. Stubenvoll:
Photothermische Messungen zur Reduktion und passiven Kompensation thermischer Linsen DGaO-Jahrestagung (06.2014), Karlsruhe; sowie Auswärtsseminar der Hochschule Zwickau, Schöneck/Vogtland (09.2014) T. Mey Strahlungseigenschaften von extremen UV- und weichen Röntgenquellen. Disputationsvortrag, Laser-Laboratorium Göttingen e.V. (11. 2014) - T. Mey, B. Schäfer, B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann, K. Tiedtke:
Measurement of Wigner distribution function for beam characterization of FELs DESY Users’ Meeting, Hamburg (01.2014) - M. Müller, F.-C. Kühl, T. Mey, K. Mann:
Emission properties and applications of ns and ps laser-induced soft x-ray sources using pulsed gas jets. COST Action MP1203 – Annual General Assembly and Training School for advanced x-ray spatial and temporal metrology, Dubrovnik (10. 2014) - D.S. Ivanov, V.P. Lipp, A. Blumenstein, V.P. Veiko, E. Jakovlev, M. E. Garcia, B. Rethfeld,
J. Ihlemann, P. Simon:
Molecular Dynamics Modeling of fs Laser Pulse Nanostructuring of Materials, ICPEPA-9,
9th International Conference on Photo-Excited Processes and Applications, Matsue, Japan (2014) - M. Kretschmar, C. Brée, A. Demircan, T. Nagy, H.G. Kurz, U. Morgner, M. Kovacev:
Direct observation of pulse splitting dynamics and self-compression along a femtosecond filament,
HILAS 2014, Berlin, Germany (regular talk, HTu1C.2) - C. Brée, M. Kretschmar, T. Nagy, M. Hofmann, A. Demircan, U. Morgner, M. Kovacev:
Fingerprint of Self-Compression in the High Harmonic Spectrum from a Filament,
HILAS 2014, Berlin, Germany (poster, JW2A.7) - F. Böhle, M. Kretschmar, A. Jullien, M. Kovacs, M. Miranda, R. Romero, H. Crespo, P. Simon,
R. Lopez-Martens, T. Nagy:
Generation of 3-mJ, 4-fs CEP-Stable Pulses by Long Stretched Flexible Hollow Fibers,
HILAS 2014, Berlin, Germany (post-deadline talk, HW5C.2) - F. Böhle, M. Kretschmar, A. Jullien, P. Simon, R. Lopez-Martens, T. Nagy:
CEP-stable, multi-mJ, 4.3 fs pulses from long stretched flexible hollow fibers,
CLEO 2014, San José, CA, USA (regular talk, SW1E.1) - M. Kretschmar, T. Nagy, A. Demircan, C. Brée, M. Hofmann, H.G. Kurz, U. Morgner, M. Kovacev:
Direct observation of pulse dynamics, influencing high-order harmonic emission along a filament,
CLEO 2014, San José, CA, USA (regular talk, STh1E.1) - L. Brusberg, M. Neitz, H. Schröder, T. Fricke-Begemann, J. Ihlemann:
Fabrication of Fresnel micro lens array in borosilicate glass by F2-laser ablation for glass interposer application, OPTO, part of Photonics West, San Francisco (02.2014) - D. Köhne, T. Fricke-Begemann, R. Weichenhain-Schriever, J. Ihlemann:
Large area silica nano grids by homogeneous high resolution laser patterning of SiOx-films,
LPM2014 – the 15th International Symposium on Laser Precision Microfabrication Vilnius, Litauen (06.2014) - M. Dubiel, M. Heinz, M. Stiebing, J. Meinertz, J. Ihlemann, T. Rainer:
Generation and characterization of plasmonic nanostructures in glass surfaces by means of excimer and solid state laser irradiation,
SPIE Optics + Photonics 2014, San Diego (08.2014) - A. Dittrich, T. Fricke-Begemann, J. Ihlemann:
Laser fabrication of silica gratings by ablation and modification of silicone films 8th International Conference on Photonic Technologies, LANE 2014, Fürth (09.2014) - J. Ihlemann:
Excimerlaser-Strukturierung von SiOx-Schichten: Herstellung von Phasenmasken und Nanonetzen,
PhotonicNet Arbeitskreistreffen DUV/VUV-Optik Braunschweig (09.2014) - J. Meinertz, R. Weichenhain-Schriever, J. Ihlemann, M. Heinz, M. Dubiel, S. Brunsch, T. Rainer:
UV-Laser-Feinststrukturierung von Glasoberflächen und ihre Anwendung zur diffraktiven Markierung, Workshop Bearbeitung von Glaswerkstoffen mit innovativen Verfahren,
Düsseldorf (10.2014) - T. Fricke-Begemann:
Mikrooptiken aus Glas und Quarzglas durch direkte UV-Laserbearbeitung, Handlungsfeldkonferenz Optische Kommunikation und Sensorik, Berlin (11.2014) - M. Heinz, M. Dubiel, J. Meinertz, J. Ihlemann, A. Hoell:
Investigation of metal nanoparticles formed by means of excimer laser irradiation of ionexchanged glasses, 88th Annual Meeting of the German Society of Glass Technology, Aachen (05.2014) - J. Ihlemann:
Laserstrukturierung von Phasenmasken in Quarzglas,
PhotonicNet Seminar Diffraktive optische Elemente – Einsatzfelder, Design,
Produktion und Messtechnik Göttingen (11.2014)
Book contributions
- K. Mann:
Lithography in the Deep Ultraviolet and Extreme Ultraviolet in: „Laser-induced Damage in Optical Materials“, Ed. D. Ristau, Taylor & Francis (12.2014) - K. Mann:
Near-edge x-ray absorption fine structure measurements using a lab-scale XUV source In: “Short Wavelength Laboratory Sources: Principles and Practices”, Ed. D. Bleiner, A. Michette et al., COST Action MP0601, DOI:10.1039/9781849735018 (12.2014) - T. Fricke-Begemann, J. Ihlemann:
Coupling to planar and strip waveguides. in: Planar Waveguides and other Confined Geometries, G. Marowsky,
Ed., Springer Series in Optical Sciences 189 (2014) pp. 169-183
Presentation “Optics / Short Wavelengths”
The following research activities of the “Optics / Short Wavelengths” department within the area of EUV/XUV technology were presented at the laser fair „LASER World of PHOTONICS“ 2011.
For interested persons this presentation is also available as Pdf-Download:
Cooperations
Boards / Commissions
- Active cooperation in VDI guideline commission “Röntgenoptische Systeme”
- Member of technical committee ‘Boulder Damage Symposium’ (USA)
- Methods of beam and optics characterization were implemented in standard specifications due to active cooperation in several DIN and ISO commissions. Furthermore, ISO standard 15367 II (wavefront measurement of laser radiation) was developed and implemented with LLG as project coordinator.
Industrial Cooperations
Our department cooperates within research projects and commissional work among others with the following companies:
Institutional Cooperations
In wissenschaftlichen Projekten wird mit folgenden Instituten zusammengearbeitet:
- Deutsches Elektronen Synchrotron (DESY) (Hamburg)
- European Space Agency (ESA)
- ETH Zürich
- FH Hildesheim/Holzminden/Göttingen
- Fraunhofer Institut für Lasertechnik (ILT) (Aachen)
- Fraunhofer Institut für Optik & Feinmechanik (IOF) (Jena)
- GSI Darmstadt
- HiLASE (Akademie der Wissenschaft Tschechien Prag)
- Institut für Physikalische Chemie (Uni Göttingen)
- Institut für Röntgenphysik (Uni Göttingen)
- Institut für Materialphysik (Uni Göttingen)
- Institut für Quantenoptik (Uni Hannover)
- Laser-Zentrum Hannover (LZH)
- Max-Born-Institut (Berlin)
- Max-Planck-Institut für Biophysikalische Chemie (Göttingen)
- Max-Planck-Institut für Dynamik und Selbstorganisation (Göttingen)
- PTB (Berlin)
