Department “Optics / Short Wavelengths”

The Optics / Short Wavelengths department is concerned with the characterization of laser light sources as well as high quality optics for beam steering and shaping. One focus is put on the deep UV wavelengths (193 nm, 248 nm) relevant for semiconductor microlithography; all other laser relevant wavelengths are also available.

In order to characterize quality and radiation stability of optical components, e.g. absorption, thermal lensing, damage thresholds and long-term degradation we operate several measuring instruments. Furthermore, propagation and coherence properties of laser radiation are measured with high-resolution wavefront sensors. Moreover, compact laser-driven plasma sources are developed in order to generate extreme ultraviolet (EUV) radiation and soft x-rays being used for several metrological applications such as absorption spectroscopy (NEXFAS), reflectometry and microscopy within the ‘water window’ (λ = 2.2 – 4.4 nm). In addition, stability and damage threshold measurements are conducted for EUV relevant materials and sensors at λ = 13.5 nm using appropriate beam shaping optics.

Astigmatic wavefront aberration of a test optic measured at the Free-Electron-Laser FLASH (left) and LiF crystal structured with EUV radiation at 13.5 nm wavelength (right)

Optics characterization

The Optics / Short Wavelengths department is concerned with the characterization of laser light sources as well as high quality optics for beam steering and shaping. One focus is put on the deep UV wavelengths (193 nm, 248 nm) relevant for semiconductor microlithography; all other laser relevant wavelengths are also available.

In order to characterize quality and radiation stability of optical components, e.g. absorption, thermal lensing, damage thresholds and long-term degradation we operate several measuring instruments. Furthermore, propagation and coherence properties of laser radiation are measured with high-resolution wavefront sensors.

Moreover, compact laser-driven plasma sources are developed in order to generate extreme ultraviolet (EUV) radiation and soft x-rays being used for several metrological applications such as absorption spectroscopy (NEXFAS), reflectometry and microscopy within the ‘water window’ (λ = 2.2 – 4.4 nm). In addition, stability and damage threshold measurements are conducted for EUV relevant materials and sensors at λ = 13.5 nm using appropriate beam shaping optics.

Damage (left) and wavefront distortion (right) of a Quartz optic due to irradiation with intense UV laser radiation

Stability of (UV-)optics

  • Laser-induced damage threshold (LIDT) (´1-on-1´, ´S-on-1´)
  • Long-term irradiation
  • Degradation tests

Single pulse (‘1-on-1’) and multiple pulse (‘S-on-1’) damage thresholds of coated and uncoated optical elements are measured according to ISO 11254 standard in an automated setup. The on site damage occurrence is detected with online video microscopy and subsequent digital image analysis.

The degradation behavior of optical components is evaluated under long-term irradiation with defined environmental parameters (e.g. inert gas atmosphere or vacuum, controlled temperature). Online monitoring of transmission / reflection allows the optical life time determination of the device.

Available light sources:

  • High power excimer laser 351 nm, 248 nm, 193 nm, 157 nm
  • Nd:YAG laser 1064 nm, 355 nm, 266 nm
  • Pulse repetition rates up to 2 kHz
  • Long-term irradiation up to 109 pulses
  • flat-top cross-section on target surface
  • Test samples: substrates, dielectric layers
Product flyer: characterization of UV optics (PDF)

Images of macroscopic destruction sites in Quartz after excimer laser or Nd:YAG irradiation respectively

Wavefront deformation / Thermal lenses

Absorption of intense laser radiation causes a thermal load in optical materials leading to local heating of the sample. Subsequentially there are two effects observable:

  • Change of local refractive index (dn/dT)
  • Surface deformation due to volume exapansion.

Each effect induces a reversible change in the optical properties, i.e. in particular a modification of the transmitted wavefront (“thermal lens”) either enhancing or compensating the overall distortion.

Furthermore, in case of amorphous optical materials (e.g. irradiation of Quartz samples with ArF excimer laser), there are irrversible changes like compaction leading to changes in density and thus in refracative index.

Both thermal lenses and compaction can be detected in real time with the help of a Hartmann-Shack wavefront sensor (cf. page Wavefront Detection). The image below shows a corresponding measurement of a thermal lens within a ArF laser irradiated (193 nm) Quartz plate. Thermal induced deformation of the wavefront develops inside the material within a few seconds. The optical power of the effect (wpv≈2nm) corresponds to a converging lens with a focal length of about 10 km.

Product flyer: Wavefront Sensor (PDF)

Thermal lens induced distorted wavefront within Quartz (phase difference in nm-range)

Absorption / Scattering

According to ISO 11551 absolute absorption of optical components is measured by a high resolution (UV-) laser calorimeter which enables the determination of linear as well as non-linear absorption losses in optical materials. For the used irradiation wavelengths (193 nm, 248 nm, 351 nm) a fast evaluation of the long-term behavior of DUV optics at low energy density is possible.

  • Precise measurement of absorption according to ISO 11551 (ppm sensitivity)
  • Determination of linear and two-photon absorption coefficients
  • Observation of aging and degradation (e.g. color center formation)
  • Non-destructive quality control of excimer laser optis

Scattering

Losses in UV-optics due to scattering are evaluated with a special setup consisting of an excimer laser as light source and a coated Ulbricht’s sphere as integrating detector.

  • Determination of total scatter (TS) in the UV spectral range
  • Sensitivity: <1 ppm at 248 nm, <30 ppm at 193 nm
  • 2D mapping of scatter distribution
Product flyer: characterization of UV optics (PDF)

Left: linear growth in absorption of a Quartz sample at 193 nm due to laser induced color center formation; right: scatter map of super polished CaF2 at 248 nm

Further information

Wavefront deformation / Thermal lenses

M. Stubenvoll et al.:
Measurement and compensation of laser-induced wavefront deformations and focal shifts in near IR optics, Opt. Expr. 22 (21) (2014)

M. Stubenvoll et al: Photothermal method for absorption measurements in anisotropic crystals,
Rev. Sci. Instr. 87 (2016)

Absorption / Scattering

C. Görling et al.:
Comparative studies of absorptance behaviour of alkaline-earth fluorides at 193 nm and 157 nm,
Appl. Phys. B. 74 (3) (2002)

C. Görling et al.:
Surface and bulk absorption in CaF2 at 193 and 157nm, Opt. Comm. 249 (1-3) (2005)

Beam propagation

Modern applications in laser technology demand a comprehensive characterization of the utilized light sources. This makes high precision techniques for determination of the spatial profile as well as standard methods for relevant beam parameters necessary. The Optics / Short Wavelengths department of the Laser-Laboratorium e.V. has been for more than 20 years involved with the comprehensive characterization of laser beam propagation. The applied camera-based detectors are suitable for a broad spectral range (NIR … DUV/EUV).

Beam profile and wavefront of an excimer laser

Beam profiling

Laser applications in industry and science often demand the highest beam stability as well as accurate spatial profile control. Thus, the determination of high resolution intensity distribution and beam parameters is essential. The Optics / Short Wavelengths department offers the comprehensive characterization of laser beams over a broad spectral range. For this task camera-based systems for measurement of near-field and far-field profiles which are sufficient to calculate laser parameters according to ISO-norm (ISO 11146, ISO 13694, ISO 15367). The optimized combination of UV converters with CCD cameras is suitable for important laser wavelengths from NIR (e.g. Nd:YAG) to DUV (ArF excimer laser), EUV (13.5 nm) and soft x-rays (1 – 5 n).

Measured intensity profiles of different lasers

  • Beam analysis (NIR, Vis, UV, EUV)
  • Beam parameters according to ISO
  • Beam propagation / focusability
  • Pointing stability
  • M2 (setup for caustic measurement)

Wavefront detection

For assessment of the light field’s phase distribution apart from mere beam profiling, camera based wavefront sensors according to the Hartmann-Shack principle are being utilized. The determination of (interpolated) beam profile, wavefront and beam parameters such as diameter, divergence and M² value for coherent radiation enables a complete description of the propagation behavior (cf. Figure 1) via solution of the Fresnel diffraction integral. Thus, the intensity distribution e.g. in far field or at the beam waist may be calculated. The derivation of these values from a single measurement with an accuracy of a few percent makes the device especially suitable for pulsed or strongly fluctuating laser sources.

The wavefront sensor is available as a commercial product, distributed by LOT Quantum Design for the European market (USA: Lightspeed Technologies), that is already applied by several companies and institutes.

Product flyer "Wavefront sensor" (PDF)

Wavefront sensor for the visible light (left) and for EUV and soft x-ray radiation (right)

Coherence analyses / Measurement of 4D coherence function

The high degree of coherence is one of the most important characteristics of laser light which allows for numerous applications. Using Young’s double slit experiment only the basic coherence properties of a beam can be measured as the entire spatial coherence function is four-dimensional.

We pursue the formalism of the Wigner distribution function representing the Fourier transform of the mutual coherence function, which includes all information on the spatial coherence properties of the radiation field. The Wigner distribution function can be accessed experimentally by caustic scans and is reconstructed by an algorithm mapping the measured beam profiles into a four-dimensional phase space. As a result, the global degree of coherence, coherence lengths and beam characteristics such as wavefront, 4D propagation matrix and M² value can be deduced easily.

The method of the Wigner distribution function is suitable for laser beams in a broad spectral range from NIR to EUV and soft x-rays.

Profiles of a caustic scan measured at the free-electron laser FLASH (wavelength 13 nm, top), reconstructed Wigner distribution function as projection (middle) and consequent beam profiles (bottom) matching the measured profiles very well. Here the global degree of coherence is K = 0.02

Further information

Wellenfront-Sensorik

B. Flöter et al.:
EUV Hartmann sensor for wavefront measurements at the Free-electron LASer in Hamburg,
New J. Phys. 12 (2010)

B. Flöter et al.:
Beam parameters of FLASH beamline BL1 from Hartmann wavefront measurements,
Nucl. Instr. Meth. Phys. Res. 635 (2011)

Kohärenz-Analyse / Messung der 4D-Kohärenzfunktion

B. Schäfer, K. Mann:
“Characterization of an ArF excimer laser beam from measurements of the Wigner distribution function”, New J. Phys. 13 (2011)

B. Schäfer et al:
“FEL beam characterization from measurements of the Wigner distribution function”, Nucl. Instr. Meth. Phys. Res. 654 (2011)

T. Mey et al:
“Wigner distribution measurements of the spatial coherence properties of the free electron laser FLASH”, Opt. Expr. 20 (2011)

EUV and soft X-ray radiation

With the help of highly excited laser-induced plasmas as compact light sources, metrology tools for the EUV/XUV spectral range (λ=1…30nm) are being developed within the department. These sources and tools enable laboratory scaled setups e.g. for spectrometry, reflectometry or stability tests independent of synchrotron radiation leading to the capability of in-house EUV/XUV material studies.

Presentation

Some short wavelength research activities of our group are shown in the following presentation being available for free download as pdf-file.

Quell-Vakuumwürfel einer Laborstrahlquelle mit Plasma im Zentrum

Laser-plasma source

By focusing an intense Nd:YAG laser (1064 nm, 700 mJ, 6 ns) into a pulsed gas target (Xenon, Oxygen) an EUV plasma is ignited. The source delivers pulse energies of about 4 mJ at 13.5 nm at repetition rates from 1…10 Hz.

One of the most distinct features is the compact arrangement allowing EUV experiments within laboratory environment. Optimized nozzle geometries lead to conversion efficiencies of up to
0.45 % (cf. also parameters in table 1).

Wavelength (Xe): 2-40 nm
Plasma diameter: 300 µm
Pulse duration: 6 ns
Repetition rate: 1…10 Hz
Conversion efficiency (Xe): 0,45 %
EUV-Photons/pulse: 2,4×1014
Pulse energy: 4,0 mJ(4PI sr, 2 %BW)

Further Advantages are:

  • Flexible choice and continuous supply of target material
  • Low amount of dbris
  • Low gas consumption
Productflyer Table-top source (PDF)

Table-top source (left), pinhole camera image of an EUV plasma (middle) and emission spectra of different target gases (right – top: EUV range, bottom: ‘water-window’)

EUV optics

For the production of high EUV energy densities a modified Schwarzschild objective for 13.5 nm radiation has been developed within the BMBF project KOMPASS (“Kompakte Strahlquelle hoher Brillanz für den weichen Röntgen-Spektralbereich”). It consists of two spherical mirrors (the substrate is ULE glass) which were each given a reflectivity of almost 70% using a Mo/Si multilayer-coating (Fraunhofer IOF). The aperture is 0.44, the magnification is 0.1. The diameter of the resulting EUV focus is < 30 µm at an energy density of about 100 mJ/cm2.

Magnification (M) 0.102
Spot size ~ 30 µm
NA 0.44
Acceptance angle (Ω) 5.33 msr
Substrates ULE glass
Reflectivity of Mo/Si multi-layers (R) > 65 % (per mirror / IOF)

Left: Prototype of the compact EUV source with integrated Schwarzschild objectiv (left). By focusing an intense Nd:YAG laser into a pulsed Xe gas target a plasma is ignited emitting radiation at 13.5 nm. Right: The Schwarzschild objective (right) was coated by Fraunhofer IOF in order to achieve a high reflectivity

The Mo/Si multilayer coating allows the Schwarzschild objective to reflect light in a narrow range at 13.5 nm. A broadband beam guidance is possible by means of total reflection at grazing angles. In the scope of the InnoNet project SpeXUV, a Kirkpatrick-Baez configuration was designed (cf. Fig. 2) to be used as a broadband condensator in a spectral photometer in the range 10…20 nm (specifications cf. Table 2).

Resolution < 10 µm (1:1-imaging)
NA 0.007
Transmission (twofold reflection)  > 65 % (> 81 % per mirror)

Schematic illustration of the Kirkpatrick-Baez assembly (left) and photograph of the built condenser (right)

Product flyer „EUV optics“ (PDF)

Nanostructuring with EUV radiation

An EUV beam focussing system as presented in the EUV-Optics section was used to investigate the interaction of pulsed soft X-ray radiation with matter for high resolution and direct structuring. This included the generation of color centers in LiF, direct photo-etching of polymers (e.g. PMMA) as well as the determination of the sensitivity of photoresists in the EUV range.

EUV direct structuring by means of generation of color centers in a LiF crystal (left) and photo-etching of a PMMA surface with EUV radiation (right). The diameter of the working spots was 5 µm and 1 µm respectively.

Diffraction of an EUV radiation: The diffractive element consisted of an etched stainless steel grid placed in front of the Schwarzschild objective. The imaging of a pinhole leads to a diffraction pattern on the PMMA probe. Left: AFM imagings of the ablation profile. Right: Comparison with a simulation

X-ray absorption spectroscopy (NEXAFS)

A table-top plasma source combined with a soft x-ray spectrometer is being used for analysis of the near-edge x-ray absorption fine structure (NEXAFS) of thin samples within the “water window”, ranging from λ = 2.2 nm … 4.4 nm. The fine structure of the absorption edges yields information on molecular orbitals, oxidation states and the coordination of an absorbing element, and can therefore be applied for chemical analysis. Due to the high absorption coefficient of the radiation the technique is extremely surface-sensitive. Single-pulse NEXAFS spectra are obtained from a broad-band Krypton plasma, transmitted through a sample and divided by a reference spectrum without the sample.

Data acquired for various organic (polymers, lipids, humic acids, etc.) and inorganic (e.g. iron minerals) samples indicate excellent agreement with synchrotron measurements (Cooperations with G. A. Univ. Göttingen, MPI f. biophys. Chemie, within the SFB 755).

Product flyer NEXAFS spectrometer (PDF)

Schematics and photo of NEXAFS spectrometer based on table-top soft x-ray source

NEXAFS spectrum of PCMO acquired with table-top soft x-ray source. The single peaks correspond to electronic transitions in unoccupied molecular orbitals and represent chemical structure and bonds of the sample

Soft x-ray microscopy

Pulsed x-rays are employed for many innovative applications ranging from structural analysis in biology and life sciences to the investigation of fundamental mechanisms of interaction with matter. Intense x-ray pulses allow, for example, tomographic images of the inside of cells or the structure determination of macromolecules with a spatial resolution on the nanometer scale. However, due to the lack of appropriate lab-scale radiation sources such studies are currently conducted at synchrotron or free-electron lasers exclusively.
Within the framework of the SFB 755 “Nanoscale Photonic Imaging” a compact laboratory x-ray microscope is developed for the “water window” spectral range (λ = 2.2 nm … 4.4 nm). A laser plasma generated in a short-pulsed gas jet is focused by a condenser mirror onto a sample, which is then imaged by a Fresnel zone plate onto a camera at high magnification. Using nitrogen as target gas (emission wavelength 2.88 nm), we have demonstrated a spatial resolution of about 50 nm.

Photograph of the table-top soft x-ray microscope, (b) intensity profiles (wavelength 2.88 nm) recorded along the optical axis behind the condenser mirror; the smallest spot size is about 430 µm and (c) Siemens star test pattern imaged with soft x-ray radiation. The inset shows the central part of the Siemens star having a feature size of 50 nm

Products and services

The department Optics / Short Wavelengths offers among others comprehensive measurement methods in order to characterize lasers and optics in the spectral range from the near IR down to soft x-ray radiation and the development of customized prototypes.

The physicist, chemists and engineers in our team hold extensive knowledge, competence and technical abilities and place it at your disposal.

Please contact us!

We are looking forward to developing tailored solutions for your problems.

Contact person:

Head of department
Dr. Klaus Mann
“Optics / Short Wavelengths”

Tel.: +49(0)551/5035-41
Fax: +49(0)551/5035-99
klaus.mann@ifnano.de

Beam profiler / caustic scan measurements

Modern applications in laser technology demand a comprehensive characterization of the utilized light sources. Thus, the department of Optics / Short Wavelengths offers high precision techniques for determination of the spatial profile as well as standard methods for relevant beam parameters for more than 20 years. For this purpose camera-based systems have been developed in order to measure the near-filed and far-field intensity profiles allowing to determine the beam parameters according to latest ISO standards (ISO 11146, ISO 13694, and ISO 15367).

• Beam analysis (NIR, Vis, UV, EUV, soft x-rays)
• Beam parameters according to ISO standards
• Beam propagation
• Pointing stability
• M2 (setup for caustic measurement)

Different beam profiles of various lasers

Product flyer Laser Bean Profiler (PDF)

Hartmann-Shack wavefront sensor (visible & IR spectral range)

Beam profiling with camera-based Hartmann-Shack wavefront sensors allows a comprehensive determination of relevant beam parameters (profile, wavefront, phase distribution, …) within one measurement making the wavefront sensor especially suitable for pulsed or fluctuating laser sources. Beam diameter, divergence and M2 are derived from the wavefront and the near-field pattern with very high accuracy from a single measurement in real time. Moreover, it enables a complete description of the propagation behavior and thus, the intensity distribution e.g. in far field or at the beam waist may be calculated.

The wavefront sensor is available as a commercial product, distributed by LOT Quantum Design for the European market (USA: Lightspeed Technologies), that is already applied by several companies and institutes.

Flyer Hartmann-Shack wavefront sensor (PDF)

Hartmann Shack wavefront sensor for the visible spectral range

You can download a free demo version of the “MrBeam”-Software developed in our department to aquire, analyse and manipulate images here:

Wavefront curvature sensor

The department Optics and Short Wavelengths started the ZIM project WKALAS (retention period 2012-2014) in order develop an innovative sensor concept for comprehensive laser beam characterization. By recording two beam profiles at neighbouring z-positions successively, it is possible to reconstruct the wavefront with high spatial resolution from the solution of the transport of intensity equation without the requirement of any external reference. The principle is applicable to a broad spectral range and for the visible and the near infrared, a very compact sensor has been realized. Beyond, in cooperation with DESY, the method has also been applied to the extreme UV at the free-electron laser FLASH in 2015. For the first time, it became possible to characterize the wavefront of the focused FEL beam at its waist position reaching a spatial resolution of below 1 µm.

Flyer Wavefront curvature sensor (PDF)

Wave fronts recorded with Curvature sensor

Photothermal setup

Absorption within the bulk and on the surfaces or dielectric coatings of an optical element under irradiation with a high power or sufficiently tightly focused laser beam causes a spatially and temporally varying temperature distribution in the sample. Using a well-proven photo-thermal setup based upon a highly sensitive Hartmann-Shack wavefront sensor bulk and surface absorption losses can be measured quantitatively.

Flyer Photothermal setup (PDF)

Laser Beam Stabilization System

The limited pointing stability of high power laser systems is a question of major concern, since fluctuations of the lateral or angular beam position can cause tremendous problems especially in industrial applications. For compensation of drift effects a Laser Beam Stabilization System was developed, which may be utilized for stabilization and realignment of practically all lasers operating in the UV-VIS-NIR spectral range.

Product flyer Laser Beam Stabilization System (PDF)

Photograph of the Laser Beam Stabilization System

Absorption, scattering & damage threshold measurements

In our department various setups for quantitative evaluation of losses and stability in laser optical components are operated, such as calorimeters, photothermal measuring stations, integral light scattering setups, and ratiometric transmission / reflectivity measurement systems. Both the total losses during (long-term) irradiation of a component as well as their individual contributions (surface, coating, bulk) are determined in order to gain insight into the causes of radiation-induced aging of UV optics.

Product flyer Optikcs characterization (PDF)

Measurement setup to determine laser-induced damage thresholds (LIDT) and for long-term irradiation experiments

Laboratory-scale plasma source for EUV and soft x-ray radiation

Laboratory-scale plasma source (left), pinhole camera image of an EUV plasma (middle) and emission spectra of different target gases (right – top: EUV spectral range, bottom: ‘water window’

Product flyer "Table-top plasma source" (PDF)

Laboratory-scale plasma source (left), pinhole camera image of an EUV plasma (middle) and emission spectra of different target gases (right – top: EUV spectral range, bottom: ‘water window’)

Hartmann wavefront sensor

In our group we developed a Hartmann wavefront sensor covering the spectral range between 1 and 60 nm. The sensor is applied by several institutes for example at laser-induced plasma sources, HHG sources, synchrotrons (Triest, Grenoble) and free electron lasers (Hamburg).

Product flyer "Hartmann wavefront sensor"

Photograph of the wavefront sensor for EUV and soft x-ray radiation (left) and measured wavefront at FLASH (DESY/Hamburg, wavelength 13.5 nm)

Soft X-ray absorption spectroscopy and microscopy

A table-top plasma source combined with a soft x-ray spectrometer is being used for analysis of the near-edge x-ray absorption fine structure (NEXAFS) of thin samples (e.g. C, N, O, Ca, K, Ti, Mn, Fe) within the “water window”, ranging from λ = 2.2 nm … 4.4 nm. The fine structure of the absorption edges yields information on molecular orbitals, oxidation states and the coordination of an absorbing element, and can therefore be applied for chemical analysis.

Additionally, in the department Optics / Short Wavelengths a compact laboratory x-ray microscope is developed for the “water window” spectral range (λ = 2.2 nm … 4.4 nm) achieving a spatial resolution of about 50 nm. Applications range from structural analysis in biology and life sciences.

Product flyer "NEXAFS-Spectrometer" (PDF)

Table-top NEXAFS-Spektrometer

Siemens star imaged with soft x-ray radiation at wavelength 2.88 nm

Staff members

Dr. Klaus Mann

Head of department

E-Mail: kmann@ifnano.de
Tel.: +49 551 5035-41

Sascha Bickhardt

Staff member

E-Mail: sascha.bickhardt@ifnano.de
Tel.: +49 551 5035-49

Jens-Oliver Dette

Staff member

E-Mail: jens-oliver.dette@ifnano.de
Tel.: +49 551 5035-55

Maik Lübbecke

Staff member

E-Mail: maik.luebbecke@ifnano.de
Tel.: +49 551 5035-49

Dr. Dirk Raiser

Staff member

E-Mail: dirk.raiser@ifnano.de
Tel.: +49 551 5035-43

Dr. Bernd Schäfer

Staff member

E-Mail: bernd.schaefer@ifnano.de
Tel.: +49 551 5035-46

Jonathan Holburg

Postgraduate

E-Mail: jonathan.holburg@ifnano.de
Tel.: +49 551 5035-42

Meike Schellhorn

Postgraduate

E-Mail: meike.schnellhorn@ifnano.de
Tel.: +49 551 5035-43

Publications

Publications

Publications

  • I. A. Makhotkin, R. Sobierajski, J. Chalupský, K. Tiedtke, G. de Vries, M. Störmer, F. Scholze, F. Siewert, R. W. E. van de Kruijs, I. Milov, E. Louis, I. Jacyna, M. Jurek, D. Klinger, L. Nittler, Y. Syryanyy, L. Juha, V. Hájková, V. Vozda, T. Burian, K. Saksl, B. Faatz, B. Keitel, E. Plönjes, S. Schreiber, S. Toleikis, R. Loch, M. Hermann, S. Strobel, H.-K. Nienhuys, G. Gwalt, T. Mey, H. Enkisch:
    “Experimental study of EUV-mirror radiation damage resistance under long term FEL exposures below the single shot damage threshold” J. Synchrotron Rad. 25, 77-84 (2018)

Conference constributions

  • K. Mann, U. Leinhos, M. Lübbecke, B. Schäfer:
    Characterization of absorptance and thermally induced wavefront deformations in DUV lithography optics SPIE Advanced Lithography, San Jose / USA (02.2018)
  • M. Schellhorn, M. Müller, K. Mann:
    Implementation of an in situ liquid-flow unit for tabletop NEXAFS spectroscopy SFB 755 Spring School, Kloster Drübeck (04.2018)
  • C. Fotso Kwamou, A. Fischer, F. Scholze, K. Mann, B. Schäfer:
    Using a wavefront sensor to optimise the alignment of beamline optics Synchrotron Radiation Instrumentation (SRI 2018), Taipeh/Taiwan (06.2018)
  • M. Vergöhl, C. Britze, S. Bruns, J. Ahrens, B. Schäfer, K. Mann, V. Kirschner:
    Development of a broadband dielectric beam splitter with reduced spectral wavefront error  SPIE Optical Systems Design, Conference “Advances in Optical Thin Films”, Frankfurt, Deutschland (06.2018)
  • K. Mann, B. Schäfer, J. Zimara, M. Vergöhl, C. Britze, S. Bruns, V. Kirschner:
    Spectrally resolved wavefront measurements on broad-band dielectric coatings,  SPIE Laser Damage Symposium, Boulder, USA (09.2018)
  • K. Mann, B. Schäfer:
    Non-linear wavefront distortion in high power laser optics COST Action CA17126, 1st General Meeting, Madrid / Spanien (11.2018)

Publications

  • M. Stubenvoll, B. Schäfer, K. Mann:
    Passive compensation of laser-induced higher-order aberrations in high-power NIR optics, Optics Express 25(21), 25407 (2017)
  • P. Vrba, M. Vrbova, M. Müller, K. Mann, D. Panek, T. Parkman:
    Picosecond Laser Krypton Plasma Emission in Water Window Spectral Range, Physics of Plasma (submitted)
  • M. Mehrjoo, K. Giewekemeyer, P. Vagovic, S. Stern, R. Bean, M. Messerschmidt, B. Keitel, E. Plönjes, M. Kuhlmann, T. Mey, E. Schneidmiller, M. Yurkov, T. Limberg, A. Mancuso:
    Single-shot determination of focused FEL wave fields using iterative phase retrieval, Optics Express, 25, 15, 17892 (2017)

Conference constributions

  • T. Mey, B. Schäfer, B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann:
    Wigner distribution measurement of the spatial coherence properties of FLASH, DESY Users’ Meeting, Hamburg (01.2017)
  • M. Müller:
    Spectro-microscopy with a compact laser-driven soft x-ray source, SFB 755 Winter School “Nanoscale Photonic Imaging”, Hirschegg, Österreich (02.2017)
  • J. Holburg, M. Müller:
    Soft x-ray spectro-microscopy with a lab-scale source, Poster, SFB 755 Winter School “Nanoscale Photonic Imaging”, Hirschegg, Österreich (02.2017)
  • I. Milov, I. Makhotkin, R. Sobierajski, H. Enkisch, K. Tiedtke, G. de Vries, F. Scholze, E. Louis, L. Juha, B. Keitel, E. Plönjes-Palm, T. Mey, K. Mann et al.:
    Single-shot damage of Ru thin film induced by XUV FEL fs pulses, Damage to VUV, EUV, and X-ray Optics (XDam6), SPIE Conf. Optics + Optoelectronics, Prag, Tschechien (04.2017)
  • I. Makhotkin, K. Tiedtke, M. Störmer, F. Siewert, K. Mann, E. Louis, L. Juha, E. Plönjes-Palm, T. Mey,
    H. Enkisch et al.:
    Irradiation of EUV-mirrors with multiple FEL pulses below the single shot damage threshold, Damage to VUV, EUV, and X-ray Optics (XDam6), SPIE Conf. Optics + Optoelectronics, Prag, Tschechien (04.2017)
  • K. Mann:
    Absorption und Wellenfrontdeformation in optischen Hochleistungskomponenten, ZIM-Netzwerk-Treffen „Photonische Prozesskette & Industrie 4.0“ (OPTILIZE I4.0), Fa. Leica / Wetzlar, eingel. Vortrag (08.2017)

Publications

  • F. Döring, H. Ulrichs, S. Pagel, M. Müller, M. Mansurova, M. Müller, C. Eberl, T. Erichsen,
    D. Huebner, P. Vana, K. Mann, M. Münzenberg, H.-U. Krebs:
    “Confinement of phonon propagatipn in laser deposited Tungsten/Polycarbonate multilayers”,
    New J. Phys.18 (2016)
  • F.- C. Kühl, M. Müller, M. Schellhorn, K. Mann, S. Wieneke, K. Eusterhues:
    “Near-edge x-ray absorption fine structure spectroscopy at atmospheric pressure with a table-top laser-induced soft x-ray source” ,
    J. Vac. Sci. Technol. A 34 (2016)
  • M. Müller, T. Mey, J. Niemeyer, M. Lorenz, K. Mann:
    “Table-to Soft X-ray Microscopy with a Laser-induced Plasma Source Based on a Pulsed Gas-jet“,
    AIP Conf. Proc. 1764 (2016)
  • M. Stubenvoll, B. Schäfer, K. Mann, O. Novak:
    “Photothermal method for absorption measurements in anisotropic crystals”,
    Rev. Sci. Instrum. 87, 023904 (2016)
  • B. Keitel, E. Plönjes, S. Kreis, M. Kuhlmann, K. Tiedtke, T. Mey, B. Schäfer, K. Mann:
    „Hartmann wavefront sensors and their application at FLASH“,
    J. Synchrotron Rad. 23, 43–49 (2016)
  • M. Nikl, V. Babin, J. Pejchal, V.V. Laguta, M. Buryi, J.A. Mares, K. Kamada, S. Kurosawa, A. Yoshikawa, D. Panek, P. Bruza, K. Mann, M. Müller:
    The stable Ce4+ center: a new tool to optimize Ce-doped oxide scintillators,
    IEEE Transactions on Nuclear Science, VOL. 63, NO. 2, 433 (2016)

Conference constributions

  • M. Müller:
    Table-top XANES spectroscopy and soft x-ray microscopy with a laser-induced plasma source,
    International Symposium “Biological Dynamics from Microscopic to Mesoscopic Scales”, Grimma (02.2016)
  • B. Schäfer:
    Strahl- und Optikcharakterisierung für Anwendungen in der Laser-Material-Bearbeitung,
    DPG Frühjahrstagung, Hannover (02.2016)
  • B. Schäfer:
    Absorption und laserinduzierte Wellenfrontdeformation in optischen Komponenten,
    PhotonikNet Workshop “Laserstrahlpropagation durch Hochleistungsoptiken”, LLG / Göttingen (03.2016)
  • T. Mey:
    Propagationseigenschaften von Laserstrahlung PhotonikNet Workshop “Laserstrahlpropagation durch Hochleistungsoptiken”,
    LLG / Göttingen (03.2016)
  • K. Mann:
    Characterization of Wavefront and Coherence properties of EUV Sources,
    SPIE Conf. “Advanced Lithography”, San Jose / USA (02.2016)
  • K. Mann:
    Characterization of Wavefront and Coherence properties of High Power Laser Sources,
    ELI Prag / CZ, eingel. Vortrag (03.2016)
  • M. Müller:
    Soft x-ray spectro-microscopy with a lab-scale source,
    SFB 755 Autumn School “Nanoscale Photonic Imaging”, Göttingen (10.2016)
  • T. Mey:
    Coherence properties of free-electron lasers Workshop on Wavefront Sensors,
    (PUCCA), ESRF Grenoble / Frankreich, eingel. Vortrag (05.2016)
  • K. Mann:
    Vom tiefen UV- in den Röntgenbereich: Überblick über aktuelle Arbeiten der Abt. Optik – Kurze Wellenlängen,
    Auswärtsseminar der Hochschule Zwickau, eingel. Vortrag (09.2016)
  • K. Mann:
    Applications of laser-driven soft x-ray sources and beam characterization at short wavelengths,
    COST Action MP1203, Athens / Greece (09.2016)
  • K. Mann:
    Absorption, Wellenfrontdeformation und Fokusshift in optischen Hochleistungs-Komponenten,
    DUV/VUV-Workshop, Fa. Berliner Glas (10.2016)
  • B. Schäfer:
    Experimental setup for measurement of the Wigner distribution and their influence on the determination of beam parameters, wavefront and spatial coherence,
    SFB 755 Autumn School “Nanoscale Photonic Imaging”, Göttingen (10.2016)
  • M. Müller:
    Soft x-ray spectro-microscopy with a lab-scale source,
    SFB 755 Autumn School “Nanoscale Photonic Imaging”, Göttingen (10.2016)
  • K. Mann:
    Applications of a Table-top Laser Driven EUV/Soft X-ray Source and Wavefront Optimization at Short Wavelengths,
    Int. Workshop on EUV and Soft X-Ray Sources, Amsterdam / NL, eingel. Vortrag (11.2016)
  • U. Leinhos, K. Mann:
    Optical metrology and loss mechansims in the UV-spectral range,
    Optimax Systems Inc, Ontario, NY/USA, eingel. Vortrag (11.2016)
  • T. Mey, B. Schäfer, B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann:
    Wigner distribution measurement of the spatial coherence properties of FLASH DESY Users’ Meeting, Hamburg (01.2016)
  • U. Leinhos, B. Schäfer, M. Stubenvoll, K. Mann:
    Absorption and wavefront deformations in high power laser optics,
    Boulder Damage Symposium, Boulder/USA (09.2016)

Book constributions

  • T. Mey:
    Brilliance Improvement of a Laser-Produced Soft X-Ray Plasma In: High Energy and Short Pulse Lasers,
    Dr. Richard Viskup (Ed.) DOI: 10.5772/64149 (2016)

Publications

  • T. Mey, S. Zayko, C. Ropers, B. Schäfer, K. Mann:
    Toroidal grating astigmatism of high-harmonics characterized by EUV Hartmann sensor.
    Optics Express 23, No. 12, 15310 (2015) DOI: 10.1364/OE.23.015310
  • O. Novák, T. Miura, M. Smrž, M. Chyla, S. Nagisetty, J. Mužík, J. Linnemann,
    H. Turčičová, V. Jambunathan, O. Slezák, J. Huynh, P. Severová, P. Navrátil,
    D. Vojna, L. Horáčková, K. Mann, A. Lucianetti, A. Endo, D. Rostohar, T. Mocek:
    Status of the High Average Power Diode-Pumped Solid State Laser Development at HiLASE Applied Sciences 5(4), 637-665 (2015) DOI:10.3390/app5040637

Conference constributions

  • T. Mey:
    Wigner distribution measurement of the spatial coherence properties of FLASH,
    Users Meeting 2015 des DESY, Hamburg (01.2015)
  • K. Mann:
    Wellenfront-Messtechnik zur Charakterisierung von Optiken und Laserstrahlung,
    DPG-Frühjahrstagung, Bochum (03.2015)
  • K. Mann:
    Messung von Absorptionsverlusten inoptischen Hochleistungskomponenten SPECTARIS Workshop “Qualitätssicherung von Hochleistungs-Laseroptiken”,
    Wetzlar, eingel. Vortrag (03.2015)
  • K. Mann:
    Table-top LPP source for spectroscopic and microscopic applications in the water window,
    EUV Workshop at HiLase, Prag, eingel. Vortrag (04.2015)
  • K. Mann:
    Table-top EUV/Soft X-ray Source and Wavefront Measurements at Short Wavelengths COST,
    Workshop MP1203, Jena (04.2015)
  • K. Mann:
    Wavefront metrology and beam characterization in the EUV/soft X-ray spectral range,
    2nd Swedish-German Workshop on X-Ray Optics, HZB Berlin-Adlershof, eingel. Vortrag (04.2015)
  • T. Mey:
    Coherence properties of free-electron,
    lasers Workshop “PhotonDiag2015”, Triest, Italien (06.2015)
  • K. Mann:
    Applications of laser-driven EUV/soft X-ray sources and wavefront measurements at short wavelengths,
    Laserlab Europe Workshop ALPS2015, Warschau, eingel. Vortrag (07.2015)
  • T. Mey:
    Wigner distribution measurement of the spatial coherence properties of FELs,
    SPIE Optics + Photonics, San Diego, USA (08.2015)
  • M. Müller:
    Table-top NEXAFS spectroscopy and soft x-ray microscopy with a laser-induced plasma source ICXOM23,
    Brookhaven National Laboratory, USA (09.2015)
  • K. Mann:
    Erzeugung und Anwendung von weicher Röntgenstrahlung aus laser-induzierten Plasmen,
    Auswärtsseminar Hochschule Zwickau, Vogtland (09.2015)
  • T. Mey:
    Beam diagnostics at EUV wavelengths,
    290. PTB-Seminar “VUV and EUV Metrology”, Berlin (11.2015)
  • K. Mann:
    Absorption, Wellenfrontdeformation und Fokusshift in optischen Hochleistungs-Komponenten,
    Optence Workshop, Bad Kreuznach, eingel. Vortrag (11.2015)
  • T. Mey, B. Schäfer, B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann:
    Wigner distribution measurement of the spatial coherence properties of FLASH,
    DESY Users’ Meeting, Hamburg (01.2015)
  • C. Thiel, M. Stubenvoll, B. Schäfer, T. Krol:
    Reliable Beam Positioning for Metal-based Additive Manufacturing by Means of Focal Shift,
    Reduction Lasers in Manufacturing Conference, München (06.2015)
  • K. Mann, B. Schäfer, M. Stubenvoll, K. Hentschel, M. Zenz:
    Measurement and compensation of wavefront deformations and focal shifts in high power laser optics,
    Boulder Damage Symposium, Boulder /USA (09.2015)
  • O. Novák, K. Mann, A. Endo, T. Mocek et al.:
    Time-resolved deformation measurement of Yb:YAG thin disk using wavefront sensor,
    Photonics West, San Francisco (01.2015)

Book constributions

  • K. Mann:
    Lithography in the Deep Ultraviolet and Extreme Ultraviolet in: Laser-Induced Damage in Optical Materials,
    Ed. D. Ristau, pp. 475 – 495, Taylor&Francis, 2015
  • K. Mann:
    Near-Edge X-ray Absorption Fine Structure Measurements Using a Laboratory-Scale XUV Source,
    in: Short Wavelength Laboratory Sources: Principles and Practices, pp. 407-413, 2015
  • M. Krämer, K. Mann:
    Broadband Multilayers:Tailor Made Mirrors for Linearly Polarized X-rays from a Laser Plasma Source,
    in: Short Wavelength Laboratory Sources: Principles and Practices, pp. 326-332, 2015

Publikationen

  • T. Mey, B. Schäfer, K. Mann , B. Keitel, M. Kuhlmann, E. Plönjes:
    Wigner distribution measurements of the spatial coherence properties of the free-electron laser FLASH, Optics Express 22, No. 13, 16571, http://dx.doi.org/10.1364/OE.22.016571, (2014)
  • M. Müller, T. Mey, J. Niemeyer, K. Mann:
    “Table-top soft X-ray microscope using laser-induced plasma from a pulsed gas jet”, Opt. Express 22 023489, (2014)
  • C. Liberatore, K. Mann, M. Müller, L. Pina, L. Juha, L. Vysin, J. Rocca, A. Endo, T. Mocek:
    “Short-wavelength ablation of polymers in the high-fluence regime “, Phys. Scr. 2014, 014066, (2014)
  • M. Stubenvoll, B. Schäfer, K. Mann:
    Measurement and compensation of laser-induced wavefront deformations and focal shifts in near IR optics, Opt. Expr. 22, 25385-25396 (2014)
  • T. Mey, B. Schäfer, K. Mann:
    Measurement of the Wigner distribution function of non-separable laser beams employing a toroidal mirror New Journal of Physics 16, 123042 (2014)
  • C. Liberatore, K. Mann, M. Müller, L. Pina, L. Juha, L. Vyšín, J. J. Rocca, A. Endo, T. Mocek:
    Short-wavelength ablation of polymers in the high-fluence regime Physica Scripta 2014, 014066 (2014)

Konferenzbeiträge

  • K. Mann:
    Table-top EUV/Soft X-ray source for metrological applications Akad. d. Wissenschaften / HiLase, Prag, eingel. Vortrag (02.2014)
  • K. Mann:
    Table-top EUV/Soft X-ray Source and Wavefront Measurements at Short Wavelengths SPIE Conf. „Advanced Lithography“ San Jose/USA (02.2014)
  • K. Mann:
    Absorption and wavefront deformations in high power laser optics Sino-German Symp. „Characterization of Laser Components“, Laser Zentrum Hannover (05.2014)
  • K. Mann:
    Stabilität optischer Komponenten für UV-Laser Bayern Photonik Workshop „UV-Laser“, Nürnberg, eingel. Vortrag (07.2014)
  • K. Mann:
    Wellenfront-Messtechnik zur Charakterisierung von Optiken und Laserstrahlung PhotonicNet Workshop „Technische Optik in der Praxis“, Göttingen, eingel. Vortrag (09.2014)
  • K. Mann:
    Absorptance, thermal lensing and damage testing in optical materials for DUV, EUV and x-ray radiation COST meeting, Lissabon (09.2014)
  • K. Mann:
    Wavefront metrology for optics and laser beam characterization Int. Conf. on Optics, Photonics & Photosciences (CIOFF), Havanna/Kuba eingel. Vortrag (10.2014)
  • K. Mann:
    Messung und Kompensation von Wellenfront-Deformationen und Fokusshift in NIR-Optiken Bayern Photonik Workshop „Thermische Linsen“, Nürnberg, eingel. Vortrag (12.2014)
  • B. Schäfer:
    Beam wavefront and spatial coherence from the Wigner distribution function COST meeting, Bern (03.2014)
  • M. Müller:
    Applications of a table-top laser-induced plasma source emitting in the soft x-ray range. Institutskolloquium Laser-Laboratorium Göttingen e.V. (03. 2014)
  • M. Müller:
    NEXAFS spectroscopy and imaging performance of a soft x-ray microscope using a table-top laser-induced plasma source. DPG-Frühjahrstagung, Berlin (03. 2014)
  • M. Müller:
    Soft x-ray microscopy and NEXAFS spectroscopy using a table-top laser-induced plasma source based on a pulsed gas jet. 2nd BOX Workshop (part of the BIO-OPT-XUV European Project), Kladno/Czech Republic (05. 2014)
  • M. Stubenvoll:
    Photothermische Messungen zur Reduktion und passiven Kompensation thermischer Linsen DGaO-Jahrestagung (06.2014), Karlsruhe; sowie Auswärtsseminar der Hochschule Zwickau, Schöneck/Vogtland (09.2014) T. Mey Strahlungseigenschaften von extremen UV- und weichen Röntgenquellen. Disputationsvortrag, Laser-Laboratorium Göttingen e.V. (11. 2014)
  • T. Mey, B. Schäfer, B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann, K. Tiedtke:
    Measurement of Wigner distribution function for beam characterization of FELs DESY Users’ Meeting, Hamburg (01.2014)
  • M. Müller, F.-C. Kühl, T. Mey, K. Mann:
    Emission properties and applications of ns and ps laser-induced soft x-ray sources using pulsed gas jets. COST Action MP1203 – Annual General Assembly and Training School for advanced x-ray spatial and temporal metrology, Dubrovnik (10. 2014)

Buchbeiträge

  • K. Mann:
    Lithography in the Deep Ultraviolet and Extreme Ultraviolet in: „Laser-induced Damage in Optical Materials“, Ed. D. Ristau, Taylor & Francis (12.2014)
  • K. Mann:
    Near-edge x-ray absorption fine structure measurements using a lab-scale XUV source In: “Short Wavelength Laboratory Sources: Principles and Practices”, Ed. D. Bleiner, A. Michette et al., COST Action MP0601, DOI:10.1039/9781849735018 (12.2014)

Publikationen

  • M. Müller, F.C. Kühl, P. Großmann, P. Vrba, K. Mann:
    Emission properties of ns and ps laser-induced soft x-ray sources using pulsed gas jets: Optics Express 21, No. 10, 1283120 (2013) DOI:10.1364/OE.21.012831
  • A.J. Corso, P. Zuppella, F. Barkusky, K. Mann, M. Müller, P. Nicolosi, M. Nardello, M.G. Pelizzo:
    Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam, J. Appl. Phys. 113, 203106 (2013) DOI: 10.1063/1.4807644

Konferenzbeiträge

  • K. Mann:
    From deep UV to soft x-rays: Overview of research at short wavelengths in the Laser Lab. Göttingen Instituts-Kolloquium Phys. Chemie, Univ. Göttingen, eingel. Vortrag (01.2013)
  • K. Mann:
    Absorption und laserinduzierte Wellenfront-Deformation in optischen Komponenten Instituts-Kolloquium Inst. f. Strahlwerkzeuge (IFSW), Univ. Stuttgart, eingel. Vortrag (01.2013)
  • K. Mann:
    From deep UV to soft x-rays: Current work in the Optics / Short wavelengths Dept. of LLG KLA Tencor, Santa Clara / USA, eingel. Vortrag (03.2012)
  • K. Mann:
    Laser beam characterization and thermal wavefront distortions in optical components 3rd Int. Conf. “Modern Laser Applications” INDLAS 2013, Bran / Rumänien, eingel. Vortrag (05.2013)
  • K. Mann:
    Laser Driven EUV/Soft X-ray Source and Wavefront Measurements at Short Wavelengths 262. PTB Seminar EUV Metrology, Physikalisch-Technische Bundesanstalt, Berlin, eingel. Vortrag (10.2013)
  • K. Mann:
    Table-top EUV/Soft X-ray Source and Wavefront Measurements at Short Wavelengths EUV Lithogtaphy Source Workshop, Dublin / Irland, eingel. Vortrag (11.2013)
  • T. Mey:
    The Wigner distribution function and its application for beam characterization Institutskolloquium Photon Science / DESY, Hamburg, eingel. Vortrag (02.2013)
  • M. Müller:
    Characterisation of EUV damage thresholds and imaging performance of Mo/Si multilayer mirrors SPIE Optics + Optoelectronics, Prag / Tschechien (04.2013)
  • T. Mey:
    Measurement of wavefront and Wigner distribution function for optics alignment and full beam characterization of FELs SPIE Optics + Optoelectronics, Prag / Tschechien (04.2013)
  • T. Mey:
    FEL beam characterization by measurement of wavefront and mutual coherence function MEADOW 2013 Workshop, Triest / Italien, eingel. Vortrag (10.2013)
  • K. Mann:
    Optics characterization in the (UV) spectral range ESA – ESDEC, Noordwijk / NL (01.2013)
  • K. Mann:
    Beam characterization in the DUV, EUV and soft x-ray region COST Action MP1203, Academy of Science, Warschau / Polen (06.2013)
  • K. Mann:
    NEXAFS spectrometer based on a lab-scale soft x-ray source Int. Congress on X-ray Optics and Microanalysis ICXOM22, Hamburg (09.2013)
  • L. Raimondi, C. Svetina, N. Mahne, D. Cocco, F. Capotondi, E. Pedersoli, M. Kiskinova , G. Brenner, E. Plönjes, B. Keitel, T. Mey, K. Mann, M. Zangrando:
    K-B bendable system optimization at Fermi@Elettra FEL: impact of different spatial wavelengths on the spot-size SPIE Optics + Optoelectronics, Prag / Tschechien (04.2013)
  • T. Mey, B. Schäfer, B. Flöter, B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann, K. Tiedtke:
    FEL beam characterization by reconstruction of the 4-dimensional Wigner distribution function DESY Users’ Meeting, Hamburg (01.2013)
  • T. Mey, B. Schäfer, K. Mann, B. Keitel, S. Kreis, M. Kuhlmann, E. Plönjes, K. Tiedtke:
    Measurement of Wigner distribution function for beam characterization of FELs Science with advanced coherent light sources, Hamburg (10.2013)
  • T. Mey, B. Schäfer, K. Mann, S. Zayko, C. Ropers, T. Salditt, B. Keitel, E. Plönjes, K. Tiedtke:
    Soft X-ray beam characterization by measurement of wavefront and Wigner distribution 1st Int. Symposium on Nanoscale Photonic Imaging, Göttingen (04.2013)
  • M. Müller, F.C. Kühl, K. Mann:
    Emission properties and applications of ns and ps laser-induced soft x-ray sources using pulsed gas jets 1st Int. Symposium on Nanoscale Photonic Imaging, Göttingen (04.2013)
  • T. Mey, B. Schäfer, K. Mann, B. Keitel, S. Kreis, M. Kuhlmann, E. Plönjes,  K. Tiedtke:
    Measurement of Wigner distribution function for beam characterization of FELs FEL2013, New York / USA (08.2013)
  • B. Schäfer, T. Mey, K. Mann, B. Keitel, S. Kreis, M. Kuhlmann, E. Plönjes-Palm, K. Tiedtke:
    Beam characterization of FLASH from beam profile measurement by intensity transport equation and reconstruction of the Wigner distribution function Proc. SPIE 8778, Advances in X-ray Free-Electron Lasers II: Instrumentation, 877810 (May 3, 2013); doi: 10.1117/12.2016975
  • C. Liberatore, K. Mann, M. Müller, L. Pina, D. Rostohar, L. Juha, A. Endo, T. Mocek:
    ‘EUV ablation of polymers in the high-fluence regime EMRS Strasbourg / F (05.2013) (Best poster award)
  • M. Stubenvoll, B. Schäfer, K. Mann, A. Walter, L. Zittel:
    Photothermal Absorption Measurements for improved thermal Stability of high-power Laser Optics SPIE Laser Damage, Boulder / USA (09.2013)

Buchbeiträge

  • K. Mann:
    Near-edge x-ray absorption fine structure measurements using a lab-scale XUV source COST Action MP0601

Publikationen

  • T. Mey, M. Rein, P. Großmann, K. Mann:
    Brilliance improvement of laser-produced soft x-ray plasma by a barrel shock, New J. Phys. 14 (2012) 073045
  • P. Grossmann, I. Rajkovic, R. Moré, J. Norpoth, S. Techert. C. Jooss, K. Mann:
    Time-resolved near-edge x-ray absorption fine structure spectroscopy on photo-induced phase transitions using a tabletop soft-x-ray spectrometer“ Rev. Scientific Instr. 83, 053110 (2012)
  • S. Döring, F. Hertlein, A. Bayer, K. Mann:
    EUV reflectometry for thickness and density determination of thin film coatings Appl. Phys. A 107, 795–800 (2012)
  • M. Müller, F. Barkusky, T. Feigl, K. Mann:
    EUV damage threshold measurements of Mo/Si multilayer mirrors, Appl.Phys. A 108(2), 263-267 (2012)
  • K. Mann, P. Großmann, M. Olschewski, J. Niemeyer:
    Röntgen-Absorptionsspektroskopie – Chemische Oberflächenanalytik mittels NEXAFS, Biotechnology & Laboratory, GIT Verlag, Wiley-VCH, July 2012

Konferenzbeiträge

  • K. Mann (eingel. Vortrag):
    From deep UV to soft x-rays: Overview of research at short wavelengths in the Laser Lab. Göttingen IOP HiLase, Akad . d. Wissenschaft, Prag / Tschechien (09.2012)
  • K. Mann:
    Messung der Absorption in (DUV-)Optiken aus laser-induzierten Wellenfront-Deformationen PhotonicNet DUV/VUV-Workshop, Hannover (03.2012)
  • T. Mey:
    Brillanzsteigerung laser-produzierter weicher Röntgenstrahlung auf Basis von Gastargets DPG Frühjahrstagung, Stuttgart (03.2012)
  • K. Mann:
    Absorption und laserinduzierte Wellenfront-Deformation in optischen Komponenten, Photonic-Net Workshop: “Thermische Stabilität von optischen Komponenten für Hochleistungslaser”, Göttingen (10.2012)
  • B. Schäfer:
    Grundlagen, Auswertung und Kalibration photothermischer Messungen mit dem Wellenfrontsensor, Photonic-Net Workshop: “Thermische Stabilität von optischen Komponenten für Hochleistungslaser”, Göttingen (10.2012)
  • M. Müller:
    X-ray and XUV plasma sources and applications, BOX seminar: “Steps towards Talbot imaging using a laboratory-scale soft x-ray plasma source”, Prag (10.2012)
  • K. Mann (eingel. Vortrag):
    Laserinduzierte Wellenfront-Deformation und thermische Linsen in optischen Komponenten, bayern photonics Workshop: “Fokus-Shift in Hochleistungs-Laseroptiken”, Nürnberg (12.2012)
  • B. Flöter, B. Schäfer, T. Mey, S. Kapitzki, B. Keitel, E. Plönjes, K. Mann, K. Tiedtke:
    FLASH Beam Characterization by Measurement of the Wigner Distribution: Coherence and Modal Analysis, HASYLAB Users’ Meeting, Hamburg (01.2012)
  • B. Keitel, S. Kapitzki, E. Plönjes, K. Tiedtke, B. Flöter, K. Mann, B. Schäfer:
    Wavefront sensors at FLASH, HASYLAB Users’ Meeting, Hamburg (01.2012)
  • K. Mann, U. Leinhos, J. Sudradjat, B. Schäfer:
    Measurement of wavefront deformations and absorptance in high power laser optics DGAO-Tagung, Eindhoven (06.2012)
  • K. Mann, P. Großmann, M. Olschewski, J. Niemeyer:
    Table-top NEXAFS spectrometer for the soft x-ray spectral range Analytica Conference 2012, München (04.2012)
  • T. Mey, B. Schäfer,  B. Flöter,  B. Keitel, M. Kuhlmann, E. Plönjes, K. Mann,  K. Tiedtke:
    FLASH Beam Characterization by Measurement of the Wigner Function: Comparison between 2009 and 2012 Science at FELs, DESY, Hamburg (07.2012)
  • K. Mann, U. Leinhos, J. Sudradjat, B. Schäfer:
    Separation of different loss channels in DUV optical elements SPIE Proc. of Boulder Damage Symp., Boulder / USA (09.2012)
  • T. Mey, K. Mann:
    Brilliance improvement of laser produced soft X-ray plasma by a barrel shock SWISS2012, Bern (09.2012)

Buchbeiträge

  • K. Mann:
    Beam characterization and homogenization of excimer lasers Handbook of Lasers and Optics, Springer-Verlag, ed. F. Träger, Berlin/Heidelberg 2012
  • B. Schäfer, K. Mann:
    FLASH beam characterization from measurement of the Wigner distribution Photon Science, Jahrbuch HASYLAB / DESY 2011

Publikationen

  • B. Flöter, P. Juranic, P. Großmann, S. Kapitzki, B. Keitel, K. Mann, E. Plönjes, B. Schäfer, K. Tiedtke:
    Beam parameters of FLASH beamline BL1 from Hartmann wavefront measurements, Nuclear Instruments and Methods in Physics Research A 635 (2011), 108
  • M. Reese, B. Schäfer, P. Großmann, A. Bayer, K. Mann, T. Liese, H.-U. Krebs:
    Submicron focusing of XUV radiation from a laser plasma source using a multilayer Laue lens, Appl. Phys. A 102 (2011), 85
  • J. Sedlmair, S.C. Gleber, C. Peth K. Mann, J. Niemeyer J. Thieme:
    Characterization of refractory organic substances by NEXAFS using a compact x-ray source, Journal of Soils and Sediments J. Soils Sediments, DOI 10.1007/s11368-011-0385-9 (2011)
  • B. Schäfer, K. Mann:
    Characterization of an ArF excimer laser beam from measurements of the Wigner distribution function, New J. Phys. 13 043013 (2011), (http://iopscience.iop.org/1367-2630/13/4/043013)
  • J. Gaudin, B. Keitel, A. Jurgilaitis, R. Nüske, L. Guérin, J. Larsson, K. Mann, B. Schäfer, K. Tiedtke,
    A. Trapp, T. Tschentscher, F. Yang, M. Wulff, H. Sinn, B. Flöter.:
    Time-resolved investigation of nanometer scale deformations induced by a high flux x-ray beam, Optics Express 19, No. 16 (2011), 15516
  •  B. Schäfer, B. Flöter, T. Mey, P. Juranic, S. Kapitzki, B. Keitel, E. Plönjes, K. Mann, K. Tiedtke:
    FEL beam characterization from measurements of the Wigner distribution function, Nuclear Inst. and Methods in Physics Research A doi:10.1016/j.nima.2011.07.031 (2011)
  • F. Barkusky, K. Mann:
    Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source, Appl. Phys. A 105 (2011), 17
  • W. Quevedo, C. Peth, G. Busse, F.  Barkusky, R. More, K. Mann, S. Techert:
    Real Time Investigation of the Strain-Stress Dynamics of Peptide Nanotubes – The Role of Pi Stacking, Journal of Physical Chemistry, accepted Sept. 2011
  • T. Liese, V. Radisch, I. Knorr. M. Reese, P. Großmann, K. Mann, H.-U. Krebs:
    Developement of Laser deposited multilayer zone plate structures for soft X-ray radiation, App. Surf. Sci. 257 (2011), 5138
  • M. Beckers, T. Senkbeil, T. Gorniak, M. Reese, K. Giewekemeye, S.-C. Gleber, T. Salditt,
    A. Rosenhahn:
    Chemical contrast in soft x-ray ptychography, Phys. Rev. Lett. 107 (2011), 208101

Konferenzbeiträge

  • B. Flöter, B. Keitel, S. Kapitzki, M. Mann, B. Schäfer, J. Gaudin, K Tiedtke:
    New Hartmann wavefront sensor for FLASH – studies on thermal mirror distortion, DESY User Meeting 2011, Hamburg (01.2011)
  • M. Reese, T. Liese, P. Großmann, H.-U. Krebs, K. Mann:
    Fokussierung von XUV-Strahlung einer Laser-Plasmaquelle mittels Multilayer-Laue-Linsen, DPG Frühjahrstagung 2011, Kiel (03.2011)
  • P. Großmann:
    NEXAFS-Spektroskopie im Bereich des Wasserfensters mit Hilfe einer auf Laserplasmen basierenden Labor-Röntgenquelle, DPG-Tagung – Fachverband Plasmaphysik, Kiel (03.2011)
  • K. Mann:
    EUV / XUV metrology – From deep ultra-violet to x-rays, Courant Research Centre “Nano-Spectroscopy and X-ray Imaging” (04.2011)
  • K. Mann:
    Application Forum, Laser 2011, München, (05.2011, eingel. Vortrag)
  • K. Mann:
    Metrology at short wavelengths – from deep ultra-violet to x-rays, FERMI Elettra, Triest, (06.2011, eingel. Vortrag)
  • B. Flöter, B. Keitel, L. Guerin, K. Mann,  K. A.  Jurgilaitis, R. Nüske, A. Trapp, T. Tschentscher, F. Yang, M. Wulff, H. Sinn, J. Gaudin:
    Time-resolved investigation of thermal distortions induced by a high flux x-ray beam in optical substrate, SPIE Optics+Optoelectronics, Prag (04.2010)
  • F. Barkusky, A. Bayer, S. Döring, P. Großmann, K. Mann:
    Radiation-induced Damage and Degradation of EUV mirrors, substrates and sensors using a table-top LPP source, SPIE Optics+Optoelectronics, Prag (04.2010)
  • B. Schäfer, B. Flöter, K. Mann, B. Keitel, E. Plönjes, K. Tiedtke:
    Beam characterization of FLASH from Hartmann data and measurement of the Wigner distribution function, SPIE Optics+Optoelectronics, Prag (04.2010)
  • K. Mann:
    Charakterisierung von Laserstrahlen und Strahlführungsoptiken mit dem Wellenfrontsensor, Auswärtsseminar FH Zwickau (08.2011, eingel. Vortrag)
  • K. Mann:
    Charakterisierung von Excimerlaserstrahlung und thermischen Linsen in Strahlführungsoptiken, Fa. Coherent (Göttingen), (09.2011, eingel. Vortrag)
  • B. Schäfer:
    Messung und Auswertung der Wignerverteilung an Excimerlasern, Fa. Coherent (Göttingen), (09.2011, eingel. Vortrag)
  • K. Mann:
    Absolute measurement of absorptance in DUV optics from laser-induced wavefront deformations, Boulder / USA (09.2011)
  • K. Mann:
    Table-top EUV/XUV source for metrology applications Prag/Kladno, (10.2011, eingel. Vortrag)
  • K. Mann:
    Optics characterization in the DUV spectral range, Fa. Sagem (11.2011)
  • Mann K:
    Table-top EUV/XUV source for metrology applications and NEXAFS spectroscopy, COST Final Event, Paris (11.2011)
  • U. Leinhos:
    Materialcharakterisierung von Quarzglasproben, Abschlusskolloquium »PoliLas«, Aachen (11.2011)
  • K. Mann:
    Charakterisierung thermischer Linsen in optischen Materialien für Hochleistungslaser, Abschlusskolloquium »PoliLas«, Aachen (11.2011)
  • K. Mann, F. Barkusky, A. Bayer, S. Döring, P. Großmann:
    EUV/XUV Radiation: a Versatile Tool for Structural and Chemical Surface Analysis, COST MP061 Meeting / Krakow, May 2010
  • B. Flöter, K. Mann, B. Schäfer, P. Juranić, S. Kapitzki, B. Keitel, K. Tiedtke:
    Wavefront sensor measurements and caustic scans at FLASH, HASYLAB Users’ Meeting, Hamburg, Januar 2011
  • K. Mann, F. Barkusky, A. Bayer, B. Flöter:
    Testing of EUV optics and sensors using focused radiation from a table-top LPP source, SPIE Advanced Lithography, San Jose /USA (3.2011)
  • K. Mann, A. Bayer, U. Leinhos, M. Schöneck, B. Schäfer:
    Measurement of Wavefront Distortions in DUV Optics due to Lens, SPIE Advanced Lithography, San Jose /USA (3.2011)
  • T. Mey, B. Flöter, B. Schäfer, K. Mann:
    Diagnostics and brilliance improvement of EUV radiation at FEL FLASH and labscale sources, 262nd PTB Seminar EUV Metrology, Berlin (10.2011)
  • A. Bayer, U. Leinhos, B. Schäfer, M. Schöneck, K. Mann:
    “nsitu Charakterisierung von Absorptionsverlusten und Degradationseffekten in Quarzglas: Photothermie & Spannungsdoppelbrechung (BMWi-Projekt PoliLas)”, DGaO-Proceedings  – www.dgao-proceedings.de – ISSN: 1614-843, (2010)
  • K. Mann, F. Barkusky, A. Bayer, B. Floeter, C. Peth:
    “Testing of EUV optics and sensors using focused radiation from a table-top LPP source”, SPIE Proc. of Advanced Lithography, (2010)
  • B. Flöter, K. Mann, B. Schäfer, B. Keitel, E. Plönjes und K. Tiedtke:
    “Hartmann-Wellenfrontmessungen am Freie-Elektronen Laser FLASH”, SNI 2010: Programm & Abstracts, Berlin, (2010)
  • U. Leinhos, K. Mann, A. Bayer, M. Endemann, D. Wernham, F. Pettazzi, D. Thibault:
    “Long-term laser irradiation tests of optical elements for ESA mission ADM-Aeolus”, Proceedings of SPIE Vol. 7794, 779405, (2010)
  • U. Leinhos, K. Mann, A. Bayer, J. Dette, M. Schöneck, M. Endemann, D. Wernham, F. Petazzi, A. Tighe, J. Alves, D. Thibault:
    “Long-term laser induced contamination tests of optical elements under vacuum at 351nm”, Proceedings of SPIE Vol. 7842, 78422E, (2010)
  • F. Barkusky, A. Bayer, C. Peth, K. Mann:
    Direct photoetching ofpolymers using radiation of high energy density from a table-top extreme ultraviolet plasma source, J. Appl. Phys. 105, 014906 (2009)
  • F. Barkusky, C. Peth, A. Bayer, K. Mann, P. Malinowski, J. John:
    Radiation damage resistance of AlGaN Detectors for Applications in the extreme-ultraviolet spectral range, Rev. Sci. Instr. 80, 093102 (2009)
  • B. Schäfer, J. Gloger, U. Leinhos, K. Mann:
    Photo-thermal measurement of absorptance losses, temperature induced wavefront deformation and compaction in DUV-optics, Opt. Expr. 17, 23025 (2009)
  • W. Quevedo, C. Peth, G. Busse, M. Scholz, K. Mann, S. Techert:
    Time-Resolved Soft X-ray Diffraction Reveals Transient Structural Distortions of Ternary Liquid Crystals, Int. J. Mol. Sci. 10, 4754-4771 (2009)
  • J. Sedlmair, S.-C. Geber, C. Peth, K. Mann, J. Thieme:
    NEXAFS spectroscopy with a laser plasma X-ray source on soil samples, J. Phys.: Conf. Ser. 186, 012034 (2009)
  • C. Peth, F. Barkusky, J. Sedlmair, S.-C. Gleber, E. Novakova, J. Niemeyer, J. Thieme, T. Salditt, K. Mann:
    Near-edge X-ray absorption fine structure measurements using a laser plasma XUV source, J. Phys.: Conf. Ser. 186, 012032 (2009)
  • J. Thieme, C. Peth, J. Sedlmaier, S.-C. Gleber, K. Mann:
    “XANES Spectroscopy of soil samples with a laser plasma x-ray source”, In Vorbereitung
  • C. Peth, W. Quevedo, F. Barkusky, G. Busse, K. Mann, S. Techert:
    “Time-resolved soft X-ray diffraction experiments using a laser-driven plasma source”, In Vorbereitung
  • F. Barkusky, A. Bayer, K. Mann, J. John, P. Malinowski:
    “Responsivity and Radiation Hardness of AlGaN Detectors for Applications in the EUV wavelength range”, to be submitted to J. Appl. Phys (in progress)
  • F. Barkusky, A. Bayer, C. Peth, K. Mann:
    “Direct photo-etching of various polymers using high fluence radiation from a table-top extreme ultraviolet plasma source”, J. Appl. Phys., 105, 014906, (2009)
  • G. Vakili Dastjerd:
    “Entwicklung eines auf EUV-Strahlung basierten Desorptionssystems zur massenspektrometrischen Untersuchung biologischer Proben”, Diplomarbeit, FH Hildesheim / Holzminden / Göttingen (HAWK), (2008)
  • C. Peth:
    “XUV-Laserplasmaquellen für die Absorptions-Spektroskopie und zeitaufgelöste Röntgenbeugung”, Dissertation, Universität Göttingen, (2008)
  • J. Gloger:
    “Optimierung des Hartmann-Shack Sensors mittels Talbot-Effekt und Messung laser-induzierter Anisotropie von Quarzglas”, Diplomarbeit, FH Hildesheim / Holzminden / Göttingen (HAWK), (2008)
  • K. Mann, A. Bayer, U. Leinhos, B. Schäfer:
    “Photo-thermal measurement of absorption and wavefront deformations in fused silica”, Proc. of SPIE, 7132, 7132-51, (2008)
  • A. Bayer, F. Barkusky, S. Döring, B. Flöter, C. Peth, K. Mann:
    “Active Beam Control for the EUV/XUV Spectral Range Using an Adaptive Kirkpatrick-Baez-Arrangement”, Proc. of SPIE, 7100A-53, 2008
  • E. Novakova, G. Mitrea, C. Peth, J. Thieme, K. Mann, T. Salditt:
    “Solid supported multi-component lipid membranes studied by X-ray spectro-microscopy”, Biointerphases, 3, FB44, 2008
  • C. Peth, F. Barkusky, K. Mann:
    “Near-edge X-ray absorption fine structure measurements using a laboratory-scale XUV source”, Journal of Physics D: Applied Physics, 41 105202, (2008)
  • K. Mann, A. Bayer, U. Leinhos, B. Schäfer:
    “A novel photo-thermal setup for determination of absorptance losses and wavefront deformations in DUV optics”, Proc. of SPIE, 6924, 6924-98, (2008)
  • A. Bayer, F. Barkusky, U. Leinhos, T. Miege, B. Schäfer, K. Mann:
    “Characterization of Absorptance Losses in Optical Materials Using a High Resolution Hartmann-Shack Wavefront Sensor”, Proc. of SPIE, 6879, 6879-46, (2008)
  • C. Peth, F. Barkusky, J. Sedlmair, S.-C. Gleber, E. Novakova, J. Niemeyer, J. Thieme, T. Salditt, K. Mann:
    “Near-Edge X-Ray Absorption Fine Structure Measurements Using a Laser Plasma XUV Source”, X-Ray Microscopy Proceedings, (2008)
  • J. Sedlmair, S.-C. Gleber, C. Peth, K. Mann, J. Thieme:
    “NEXAFS spectroscopy with a laser plasma X-ray source on soil samples”, X-Ray Microscopy Proceedings, (2008)
  • F. Barkusky, A. Bayer, C. Peth, K. Mann:
    “Direct Photo-Etching of PMMA by Focused EUV Radiation From a Compact Laser Plasma Source”, Proc. of SPIE, 6879, 6879-39, (2008)
  • F. Barkusky, C. Peth, A. Bayer, K. Mann:
    “Direct photo-etching of poly(methyl methacrylate) using focused extreme ultraviolet radiation from a table-top laser-induced plasma source”, Journ. Appl. Phys. 101, 124908, (2007)
  • C. Peth, A. Kalinin, F. Barkusky, K. Mann, J.P. Toennies, L. Rusin:
    “XUV laser-plasma source based on solid Ar filament”, Rev. Sci. Instr. 78, 1 (2007)
  • A. Bayer, F. Barkusky, C. Peth, H. Töttger, K. Mann:
    “Compact EUV Source and Optics for Direct Structuring of Surfaces”, Photonics West: LASE 2007, Proceedings of SPIE Vol. 6458, 64580Z, (2007)
  • B. Schäfer, K. Mann:
    “Accuracy of laser beam parameters and propagation from real-time Hartmann-Shack experiments”, Photonics West: LASE 2007, Proceedings of SPIE Vol. 6452, 6452-2, (2007)
  • K. Mann, T. Miege, U. Leinhos, B. Schäfer:
    “Characterization of absorptance losses and wavefront deformation in DUV optics”, Proc. of SPIE, Int. Symp. on Advanved Lithography‘, San Jose, Ca (USA), (2007)
  • F. Barkusky, A. Bayer, C. Peth, H. Töttger, K. Mann:
    “Compact EUV source and Schwarzschild objective for modification and ablation of various materials”, SPIE Europe, Proc. Of SPIE, Vol. 6586, 6586-10, (2007)
  • K. Mann, A. Bayer, T. Miege, U. Leinhos, B. Schäfer:
    “A Novel Photo-Thermal Setup for Evaluation of Absorptance Losses and Thermal Wavefront Deformations in DUV Optics”, Proceedings of the 39th Boulder Damage Symposium, Boulder, Co (USA), SPIE Vol. 6720, 6720-72, (2007)
  • B. Kühn, S. Kaiser, T. Miege, B. Uebbing, K. Mann:
    “Minimizing Losses in Synthetic Fused Silica for Immersion Lithography”, 4. Symposium on Immersion Lithography, Keystone, Co (USA), (2007)
  • K. Mann, B. Schäfer: “Photothermisches Verfahren für Hartmann-Shack-Sensor; Neue Absorptionsmessungen”, Optolines 16, 8-9, 2007
  • K. Mann u.a.:
    “Röntgenoptische Systeme”, VDI/VDE-Richtlinie, VDI/VDE 5575,  (2007)
  • T. Miege:
    “Charakterisierung thermisch belasteter Optiken mit einem Hartmann-Shack Wellenfrontsensor”, Diplomarbeit, FH-Merseburg, 12/2006, (2007)
  • H. Töttger:
    “Charakterisierung von Gas-Targets mittels Wellenfrontsensorik zur Optimierung laserproduzierter EUV-Plasmen”, Masterarbeit, FH Holzminden/Hildesheim/Göttingen (HAWK), (2007)
  • B. Schäfer, M. Lübbecke, K. Mann:
    “Hartmann-Shack Wavefront measurements for real time determination of laser beam propagation parameters”, Rev. Sci. Instr., 77, 1, (2006)
  • B. Schäfer, M. Lübbecke, K. Mann:
    “Propagation Analysis of laser beams from Hartmann-Shack measurements”, Proc. of SPIE, Vol. 6343, 634348, (2006)
  • A. Bayer, F. Barkusky, C. Peth, H. Töttger, K. Mann:
    “Compact EUV Source and Optics for Applications apart from Lithography”, Proc. of SPIE, Vol. 6317, 631706, (2006)
  • F. Barkusky, C. Peth, A. Bayer, K. Mann:
    “Ablation of PMMA using focused extreme ultraviolet radiation from a table-top laser-induced plasma source”, J. Appl. Phys., submitted
  • K. Mann, F. Barkusky, A. Bayer, C. Peth, H. Töttger:
    “Compact source and beam delivery system for EUV radiation”, Proc. of SPIE, Vol. 6151, 615166, (2006)
  • K. Mann, U. Leinhos, B. Schäfer:
    “Characterization of absorption losses in deep UV optical materials”, Proc. of SPIE, Vol. 6403, 640379, (2006), Boulder
  • C. P. Hauri, J. Biegert, U. Keller, B. Schaefer, K. Mann, G. Marowsky:
    “Validity of wave-front reconstruction and propagation of ultrabroadband pulses measured with a Hartmann–Shack sensor”, Optics Letters 30 (12) 1563 (2005)
  • Ch. Görling, U. Leinhos, K. Mann:
    “Surface and bulk absorption in CaF2 at 193 nm and 157 nm”, Opt. Commun. 249/1-3, 319 (2005)
  • M. Kunzmann, B. Schäfer, K. Mann:
    “Charakterisierung von Laserstrahlung mit dem Wellenfrontsensor”, in: Photonik 1 (2005)
  • B. Schäfer, K.Mann, G. Marowsky, C.P. Hauri, J. Biegert, U. Keller:
    “Characterisation, Wavefront Reconstruction and Propagation of Ultra-broadband Laser Pulses from Hartmann-Shack Measurements”, DGaO-Proceedings zur 106. Jahrestagung, Online-Journal http://www.dgao-proceedings.de/archiv/106_chronologisch_d.php (2005)
  • F. Barkusky, C. Peth, K. Mann, T. Feigl, N. Kaiser:
    “Direct writing of color centers in LiF using a laser-induced EUV plasma in combination with a Schwarzschild objective”, Rev. Sci. Instr. (2005)
  • B. Schäfer, K. Mann:
    “Laserstrahl-Charakterisierung in Echtzeit: Hartmann-Shack-Wellenfrontsensor”, Optolines 7 (3), S. 6 (2005)
  • K. Mann:
    “Compact source and beam delivery system for EUV radiation using a Schwarzschild objective”, Proceedings of SPIE, Annual Meeting
  • B. Schäfer, K. Mann, G. Marowsky, C.P. Hauri, J. Biegert, U. Keller:
    “Characterisation, Wavefront Reconstruction and Propagation of Ultra-broadband Laser Pulses from Hartmann-Shack Measurements”, Proceedings of SPIE Vol. 5918, p. 194-202 (2005)
  • A. Bayer, F. Barkusky, C. Peth, H. Töttger, K. Mann, T. Feigl, N. Kaiser:
    “Imaging properties of different optics for EUV radiation”, Proceedings of SPIE Vol. 5962, p. 59620R-1-59620R-12 (2005)
  • S. Döring:
    “Konzeption, Aufbau und Inbetriebnahme eines Reflektometers für den EUV-Bereich unter Verwendung einer laserinduzierten Plasmaquelle”, Diplomarbeit, Universität Göttingen, (2005)
  • B. Reiter:
    “Preparation and Characterisation of a Cryogenic Filament as a Laser Target for the Production of EUV and Soft X-ray Plasmas”, Diplomarbeit Fachhochschule Hildesheim/Holzminden/Göttingen

Presentation “Optics / Short Wavelengths”

The following research activities of the “Optics / Short Wavelengths” department within the area of EUV/XUV technology were presented at the laser fair „LASER World of PHOTONICS“ 2011.

For interested persons this presentation is also available as Pdf-Download:

Download LLG-presentation "Optics / Short Wavelengths"

Cooperations

Boards / Commissions

Dr. K. Mann:

  • Active cooperation in VDI guideline commission “Röntgenoptische Systeme”
  • Member of technical committee ‘Boulder Damage Symposium’ (USA)
  • Methods of beam and optics characterization were implemented in standard specifications due to active cooperation in several DIN and ISO commissions. Furthermore, ISO standard 15367 II (wavefront measurement of laser radiation) was developed and implemented with LLG as project coordinator.

Industrial Cooperations

Our department cooperates within research projects and commissional work among others with the following companies: